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公开(公告)号:US20230264987A1
公开(公告)日:2023-08-24
申请号:US18171757
申请日:2023-02-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yongjai LEE , Sanghoon Yoon , Huchul Lee , Byungchan Choi , Jieun Jang
IPC: C02F1/42
CPC classification number: C02F1/42 , C02F2103/04
Abstract: An ultrapure water (UPW) production facility includes a polisher filled with an ion exchange resin, an inflow line, an inflow valve connected to the inflow line and upstream of the polisher, an outflow line, an outflow valve connected to the outflow line and downstream of the polisher, a first drain line connected to the polisher, a first drain valve connected to the first drain line and downstream of the polisher, a second drain line branched from the outflow line, a second drain valve connected to the second drain line, a discharge line branched from the second drain line, a discharge valve connected to the discharge line, wherein the inflow valve, the outflow valve, the first drain valve, the second drain valve, and the outflow valve are automatic valves.
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公开(公告)号:US20230264981A1
公开(公告)日:2023-08-24
申请号:US18083124
申请日:2022-12-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Younhaeng LEE , Cheolmin Shin , Changyeol Ham , Jieun Jang
CPC classification number: C02F1/285 , C02F1/42 , C02F1/46104 , C02F1/72 , C02F1/32 , C02F1/58 , C02F2101/108
Abstract: A management method of a system for producing an ultrapure water, the system including a boron removal tower including an accommodation space through which water to be processed passes and a boron adsorption resin filling the accommodation space of the boron removal tower, and the boron removal tower including a plurality of sample ports through which a plurality of sample waters to be processed passing through portions having different heights of the boron adsorption resin, are respectively discharged, and determining a replacement cycle of the boron adsorption resin by increasing a passing flow rate of the boron removal tower.
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公开(公告)号:US20230303416A1
公开(公告)日:2023-09-28
申请号:US18065857
申请日:2022-12-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jongha Yun , Gwangwon Son , Jieun Jang , Wuyoung Choi , Eunhye Park
IPC: B08B3/14 , C02F9/00 , B01D63/02 , H01L21/67 , B01D15/36 , B01D61/02 , B01D61/08 , B08B3/02 , B08B13/00 , H01L21/306
CPC classification number: C02F9/00 , B01D15/361 , B01D61/025 , B01D61/08 , B01D63/02 , B08B3/022 , B08B3/14 , B08B13/00 , H01L21/30604 , H01L21/6708 , C02F2103/04
Abstract: An ultrapure water supply apparatus includes a first filtering device, a second filtering device, a first tank between the first and second filtering devices, a third filtering device, a second tank between the second and third filtering devices, a fourth filtering device, a third tank between the third and fourth filtering devices, and a gas supply device connected to each of the first to third tanks and configured to supply an inert gas. Each of the first to third tanks includes a tank body and a breather valve coupled to the tank body and connected to a storage space in the tank body. Each of the first to fourth filtering devices includes at least one selected from an activated carbon filter device, an ion exchange resin device, a reverse osmosis membrane device, and a hollow fiber membrane device.
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公开(公告)号:US20230266066A1
公开(公告)日:2023-08-24
申请号:US18090094
申请日:2022-12-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Younhaeng Lee , Gwangwon Son , Jieun Jang , Wuyoung Choi , Eunhye Park
CPC classification number: F28D7/082 , B08B3/10 , B08B13/00 , B08B2203/007
Abstract: A fluid supply includes a first fluid source configured to supply a first fluid, a second fluid source configured to supply a second fluid, a heat exchanger configured to exchange heat between the first fluid and the second fluid, a first fluid recovery tank configured to recover the first fluid that has passed through the heat exchanger, and a first transfer pipe configured to transfer the first fluid from the first fluid source to the first fluid recovery tank via the heat exchanger. The heat exchanger may be disposed at a vertical level higher than a vertical level of the first fluid recovery tank.
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