公开(公告)号：US5279723A

公开(公告)日：1994-01-18

申请号：US921780

申请日：1992-07-30

Applicant: Steven Falabella ,  David M. Sanders

Inventor： Steven Falabella ,  David M. Sanders

IPC: C23C14/22 ,  H01J27/02 ,  H01J27/14 ,  C23C14/32

CPC classification number: H01J27/022 ,  C23C14/221 ,  H01J27/14 ,  H01J2237/022 ,  H01J2237/3142

Abstract: A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45.degree. to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles.

Abstract translation: 连接的阴极电弧离子源，其耦合到能够从由阴极电弧放电产生的离子通量分离或消除大颗粒的宏粒子过滤器。 离子源在具有锥形侧面的阴极（靶）上采用轴向磁场以限制电弧，从而提供高目标材料利用率。 弯曲的磁场用于将金属离子从目标引导到待涂覆的部分。 宏粒子过滤器由两个直线螺线管组成，端对端，但彼此成45度，从而防止目标上的电弧点到待涂覆部件的视线，同时为 离子和电子流动，并且包括用于捕获大颗粒的一系列挡板。