公开(公告)号：US20170189932A1

公开(公告)日：2017-07-06

申请号：US14988677

申请日：2016-01-05

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Ming-Hsiang Hung ,  Teng-Yi Huang ,  Fu-Jen Tien ,  Li-Jen Wu ,  Cheng-Ming Wu ,  Teng-Hwee Ng ,  Ming-Yang Chuang

IPC: B05C19/00 ,  B05D1/00

CPC classification number: B05C19/008 ,  B05B14/44 ,  B05C5/02 ,  B05C11/08 ,  H01L21/00 ,  H01L21/67017 ,  H01L21/6715

Abstract: A coater includes a chuck, a source of a coating material, a dispensing head, an exhaust system, and a liner. The chuck is configured to support a wafer. The dispensing head is configured to dispense the coating material onto the wafer. The exhaust system is configured to exhaust the excess coating material. The liner is present at least partially on an inner surface of the exhaust system. The liner has a stick resistance to the coating material, and the stick resistance of the liner is greater than a stick resistance of the inner surface of the exhaust system.