公开(公告)号：US10684559B2

公开(公告)日：2020-06-16

申请号：US15902528

申请日：2018-02-22

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yu-Fu Lin ,  Tung-Jung Chang ,  Chia-Chen Chen

IPC: G03B27/42 ,  G03F7/20 ,  B08B3/12 ,  B08B7/02

Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.