公开(公告)号：US5949803A

公开(公告)日：1999-09-07

申请号：US64379

申请日：1998-04-22

Applicant: Howard C. Brayman ,  Mark S. Prichard ,  John P. Spoonhower ,  Nicholas Touchard ,  Thierry Vachette

Inventor： Howard C. Brayman ,  Mark S. Prichard ,  John P. Spoonhower ,  Nicholas Touchard ,  Thierry Vachette

IPC: G02B26/10 ,  H01S3/10

CPC classification number: G02B26/10

Abstract: A method for exposing light sensitive material to provide exposure patches representing the material sensitivity and which minimizes the effects of intermittency of the light sensitive material, including providing a source of laser light by producing a laser light beam by a continuous wave pump laser which produces a first beam of light and a continuous wave dye laser responsive to the beam of light to produce a second beam of light having gaussian intensity distributions in two orthogonal directions; shaping the second light beam so as to produce a substantially square wave intensity distribution in one direction, while the other direction has a gaussian distribution; and scanning the shaped second light beam through a target of different uniform densities and onto light sensitive material so as to produce a series of exposure patches in one scan of different densities but with the density in each exposure patch being uniform, whereby the effect of intermittency in the light sensitive material is minimized.

Abstract translation: 一种用于曝光光敏材料以提供表示材料灵敏度并且最小化光敏材料的间歇效应的曝光片的方法，包括通过连续波泵激光器产生激光束来提供激光源，该连续波泵激光器产生 第一光束和响应于光束的连续波染料激光器产生在两个正交方向上具有高斯强度分布的第二光束; 对所述第二光束进行成形，以在一个方向上产生大致方波强度分布，而另一方向具有高斯分布; 并且将成形的第二光束通过不同均匀密度的靶并扫描到光敏材料上，以便在不同密度的一次扫描中产生一系列曝光片，但是每个曝光片中的密度是均匀的，由此间歇性 在光敏材料中被最小化。