摘要:
A process for easy production of a liquid crystal cell substrate having a TFT driver element which contributes to reducing viewing angle dependence of color of a liquid crystal display device is provided: a process using a transfer material, more preferably, a process which comprises the following steps [1] to [4] in this order: [1] transferring on a TFT substrate a transfer material having a photosensitive polymer layer and an optically anisotropic layer on a temporary support; [2] separating the temporary support from the transfer material on the TFT substrate; [3] subjecting the transfer material to light exposure on the TFT substrate; and [4] removing unnecessary parts of the photosensitive polymer layer and the optically anisotropic layer on the substrate.
摘要:
A novel transfer material is disclosed. The transfer material comprises, at least, a support, and, thereon, an optically uniaxial or biaxial anisotropic layer and a photosensitive polymer layer. A novel process for producing a liquid crystal cell substrate is also disclosed. The process comprises, at least, [1] laminating a transfer material as set forth in any one of claims 1 to 11 on a substrate; [2] removing the support from the transfer material laminated on the substrate; and [3] exposing the photosensitive polymer layer disposed on the substrate to light.
摘要:
A semi-transmissive liquid crystal display device of the present invention is so configured that a diffraction film and a light scattering layer are provided on a color-filter substrate on the side thereof on which a display screen resides, and the light scattering layer is disposed nearer a liquid crystal layer than the diffraction film. The semi-transmissive liquid crystal display device thus configured has improved viewing-angle characteristics in the transmissive mode.
摘要:
A method for fabricating an active matrix LCD panel for use in an active matrix LCD device includes the step of forming a passivation layer acting as a channel protection layer for protecting an amorphous silicon active layer, thereby reducing the number of photolithographic steps. A transparent conductive film is used for forming a gate electrode and a pixel electrode before formation of an amorphous silicon film for the TFTs.
摘要:
A lower layer metal wiring is led out from a display portion to a terminal portion provided to the periphery of the glass substrate and covered at the upper surface with an interlayer insulation film. An upper layer metal wiring formed on the interlayer insulation film is connected to the lower layer metal wiring by way of contact holes formed in the interlayer insulation film. The upper layer metal wiring is completely covered by the transparent conductive film. A protective insulation film is formed on the transparent conductive film, and an opening is made in to the protective insulation film in the terminal portion. In the terminal portion, copper foil wirings of a flexible wiring substrate are connected by way of an anisotropic conductive film. The upper layer metal wiring is removed at a portion not protected by the protective insulation film or the anisotropic conductive film.