Electron device and method for manufacturing an electron device

    公开(公告)号:US10062538B2

    公开(公告)日:2018-08-28

    申请号:US14876191

    申请日:2015-10-06

    CPC classification number: H01J25/34 H01J23/26 H01J23/28

    Abstract: According to embodiments of the present invention, an electron device is provided. The electron device includes a support substrate, a conductive planar slow-wave structure on the support substrate, the conductive planar slow-wave structure being adapted to receive an electromagnetic wave signal for interaction with an electron beam, and a dielectric layer arrangement in between the conductive planar slow-wave structure and the support substrate, the dielectric layer arrangement being arranged on the support substrate at only one or more support substrate portions overlapping with the conductive planar slow-wave structure. According to further embodiments of the present invention, a method for manufacturing an electron device is also provided.

    Vhf slow wave structure
    15.
    发明授权
    Vhf slow wave structure 失效
    甚高频慢波结构

    公开(公告)号:US3792302A

    公开(公告)日:1974-02-12

    申请号:US3792302D

    申请日:1972-12-22

    Applicant: RAYTHEON CO

    Inventor: DOWNING A KRAHN H

    CPC classification number: H01J23/28

    Abstract: A very high frequency electromagnetic energy device with a slow wave structure is disclosed having impedance matching means and lumped as well as distributed elements for energy propagation. An embodiment comprises a backward wave oscillator device incorporating elements used at microwave frequencies together with lumped capacitance and inductance elements to provide a device operative in a frequency range of, illustratively 100 to 200 MHz.

    Abstract translation: 公开了一种具有慢波结构的非常高频率的电磁能量装置,其具有阻抗匹配装置和集中以及用于能量传播的分布元件。 一个实施例包括一个反向波形振荡器装置,其包括微波频率下使用的元件以及集中的电容和电感元件,以提供在例如100至200MHz的频率范围内工作的器件。

Patent Agency Ranking