Abstract:
A glass substrate for p-Si TFT flat panel displays that is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. A method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
Abstract:
A glass-substrate manufacturing method which includes a forming step and a cooling step. In the forming step, a molten glass is formed into a sheet glass by a down-draw process. In the cooling step, the sheet glass is cooled. The cooling step includes first, second and third coating steps as defined herein.
Abstract:
A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
Abstract translation:一种由具有高低温粘度特性温度的玻璃制成的p-Si TFT平板显示器基板,并且在通过直接电加热熔化期间避免熔化槽的侵蚀/磨损而制造。 所述玻璃基板包含52-78质量%的SiO 2,3-25质量%的Al 2 O 3,3-15质量%的B 2 O 3,3-20质量%的RO,其中RO是MgO,CaO,SrO和BaO的总量 ,0.01-0.8质量%的R 2 O,其中,R 2 O为Li 2 O,Na 2 O,K 2 O的总量,Sb 2 O 3为0〜0.3质量%,基本上不包含As 2 O 3,CaO / (SiO2 + Al2O3)/ B2O3的质量比(SiO 2 + Al 2 O 3)/ B 2 O 3在7〜30的范围内,质量比(SiO 2 + Al 2 O 3)/ RO等于或大于5.相关方法包括将玻璃原料混合 提供玻璃组成; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。
Abstract:
A method for manufacturing a glass substrate for a display includes a step of producing a glass substrate and a step of performing a surface treatment on one glass surface of major surfaces of the glass substrate to form surface unevenness. The surface treatment is performed such that protruded portions having a height of 1 nm or more from the surface roughness central plane of the surface unevenness are dispersedly provided on the glass surface after the surface treatment and the area ratio of the protruded portions with respect to the area of the glass surface is 0.5-10%. Using this glass substrate, semiconductor elements are formed on a major surface of the glass substrate opposite to the glass surface. Accordingly, a display panel is produced.
Abstract:
A glass substrate for p-Si TFT flat panel displays that is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. A method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
Abstract translation:一种用于p-Si TFT平板显示器的玻璃基板,由玻璃构成,包括SiO 2为52-78质量%,Al 2 O 3为3〜25质量%,B 2为3〜15质量%,RO为3〜25质量% 其中RO为MgO,CaO,SrO和BaO的总量,Fe2O3为0.01-1质量%,Sb2O3为0-0.3质量%,并且实质上不包含As2O3,玻璃的质量比(SiO 2 + Al 2 O 3)/ B2O3的范围为7〜30,质量比(SiO 2 + Al 2 O 3)/ RO为6以上。玻璃基板的制造方法包括:熔融步骤,通过熔融获得熔融玻璃,至少使用 直接电加热,玻璃原料混合以提供上述玻璃组合物; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。
Abstract:
A glass substrate for a display, which is formed of a glass having a light weight and having high refinability with decreasing environmental burdens, the glass comprising, by mass %, 50 to 70% of SiO2, 5 to 18% of B2O3, 10 to 25% of Al2O3, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 5 to 20% of RO (in which R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba), and over 0.20% but not more than 2.0% of R′2O (in which R′ is at least one member selected from the group consisting of Li, Na and K), and containing, by mass %, 0.05 to 1.5% of oxide of metal that changes in valence number in a molten glass, and substantially containing none of As2O3, Sb2O3 and PbO.
Abstract translation:一种显示器用玻璃基板,其由重量轻且具有降低的环境负荷的高可熔性的玻璃形成,所述玻璃以质量%计含有50〜70%的SiO 2,5〜18%的B 2 O 3,10〜 25%的Al 2 O 3,0〜10%的MgO,0〜20%的CaO,0〜20%的SrO,0〜10%的BaO,5〜20%的RO(其中R为选自 由Mg,Ca,Sr和Ba组成的组)和超过0.20%但不超过2.0%的R'2O(其中R'为选自Li,Na和K中的至少一种), 并且以质量%计含有熔融玻璃中价数变化的金属氧化物的0.05〜1.5%,并且基本上不含有As 2 O 3,Sb 2 O 3和PbO。