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21.发明授权Image record apparatus and image record method for calculating and setting a pre-record volume 有权用于计算和设置预录音量的图像记录装置和图像记录方法公开(公告)号：US08355061B2
公开(公告)日：2013-01-15
申请号：US12673830
申请日：2009-02-24
IPC分类号： H04N5/76
CPC分类号： H04N5/77 , G08B13/19676 , H04N21/4331
摘要： An object of the invention is to provide an image record apparatus and an image record method that can improve the use efficiency of a record medium for recording a video image from a camera. A NW control section (141) acquires the image quality and the resolution set in a camera (10) performing pre-record and calculates the maximum image size that can be transmitted by the camera (10), and a file system (142) calculates the number of images from the preset pre-record rate and pre-record time and reserves an area corresponding to the maximum image size of one pre-record image calculated by the NW control section (141) in an HDD (146). The NW control section (141) records a pre-record image transmitted from the camera (10) in the area reserved by the file system (142). When it records as many pre-record images as the number of pre-record images, it returns to the beginning of the area reserved by the file system (142) and continues recording a pre-record image is continued. When an alarm occurs while a pre-record image is recorded, the NW control section 141 determines that the pre-record image at the point in time is pre-record data.
摘要翻译： 本发明的目的是提供一种可以提高用于记录来自照相机的视频图像的记录介质的使用效率的图像记录装置和图像记录方法。 NW控制部（141）获取执行预记录的摄像机（10）中设定的图像质量和分辨率，并计算可由摄像机（10）发送的最大图像尺寸，文件系统（142）计算 从预设的预记录速率和预记录时间的图像数量，并且保留与由HDD（146）中的NW控制部分（141）计算的一个预记录图像的最大图像尺寸相对应的区域。 NW控制部（141）将从摄像机（10）发送的预录像图像记录在由文件系统（142）保留的区域中。 当它记录与预先记录的图像数量一样多的预先记录的图像时，它返回到由文件系统（142）保留的区域的开头，并继续记录预记录图像。 当记录预记录图像时发生报警时，NW控制部分141确定在该时间点的预记录图像是预记录数据。
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公开(公告)号：US08354215B2
公开(公告)日：2013-01-15
申请号：US12883592
申请日：2010-09-16
CPC分类号： G03F7/425
摘要： Disclosed is a method for stripping a photoresist comprising: (I) providing a photoresist pattern on a substrate where the substrate has at least a copper (Cu) wiring and a low-dielectric layer thereon, and selectively etching the low-dielectric layer by using the photoresist pattern as a mask; (II) contacting the substrate after the step (I), with ozone water and/or aqueous hydrogen peroxide; and (III) contacting the substrate after the step (II), with a photoresist stripping solution that contains at least a quaternary ammonium hydroxide. The present invention provides a method for stripping a photoresist that enables to strip effectively photoresist films and etching residues after etching step even in a process not including an O2 plasma ashing treatment in micropatterning of a substrate having at least Cu wiring and a low-dielectric layer thereon, as in a dual damascene forming process, and, in addition, the method of the invention does not have any negative influence on the dielectric constant of the low-dielectric layer, and ensures an excellent anti-corrosivity.
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公开(公告)号：US20090231426A1
公开(公告)日：2009-09-17
申请号：US12302419
申请日：2007-05-23
IPC分类号： H04N7/18
CPC分类号： G11B20/10 , G06F3/0601 , G06F11/2056 , G06F2003/0692 , G11B2220/2516 , H04N5/765 , H04N5/77 , H04N5/775 , H04N5/781 , H04N9/7921
摘要： An image recording/reproducing device is provided which, when a removable recording unit is mounted, can continuously use the unit while keeping previously recorded images and can improve convenience. A recording device 16 is an image recording/reproducing device and an HDD is a removable recording unit. When an HDD is added, the recording device 16 determines a format status of the added HDD, and further determines whether an HDD operation status, such as Single operation or Mirror operation, corresponds with a device operation status of the recording device 16 or not. The HDD operation status corresponds to a unit operation status. The recording device 16 recognizes an added HDD which is in the recording-device-formatted state and whose HDD operation status corresponds with the device operation status, with the current HDD operation status. The recording device 16 recognizes an added HDD which is in the recording-device-formatted sate and whose HDD operation status is different from the device operation status, with the HDD operation status rewritten such that it corresponds with the device operation status.
摘要翻译： 提供一种图像记录/再现装置，当安装可拆卸记录单元时，可以连续使用该单元，同时保持先前记录的图像并且可以提高方便性。 记录装置16是图像记录/再现装置，HDD是可移除记录单元。 当添加HDD时，记录装置16确定所添加的HDD的格式状态，并进一步确定诸如单次操作或镜像操作之类的HDD操作状态是否对应于记录装置16的装置操作状态。 HDD操作状态对应于单元操作状态。 记录装置16利用当前的HDD操作状态识别处于记录装置格式化状态的附加HDD以及其HDD操作状态对应于装置操作状态。 记录装置16识别在记录装置格式化状态下的添加的HDD，并且其HDD操作状态与设备操作状态不同，HDD操作状态被重写以使其对应于设备操作状态。
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24.发明申请Treating liquid for photoresist removal, and method for treating substrate 审中-公开处理用于光刻胶去除的液体，以及处理底物的方法公开(公告)号：US20090176677A1
公开(公告)日：2009-07-09
申请号：US12382231
申请日：2009-03-11
IPC分类号： G03F7/42
CPC分类号： H01L21/31133 , G03F7/423
摘要： Disclosed are a treating liquid for photoresist removal, containing (a) an oxidizing agent (e.g., aqueous hydrogen peroxide), (b) at least one selected from alkylene carbonates and their derivatives (e.g., propylene carbonate), and (c) water; and a method for treating with the treating liquid a substrate having a photoresist film deteriorated after dry-etching treatment thereof or a substrate optionally subjected to plasma-ashing treatment after the dry-etching treatment, and then treating it with a photoresist-stripping liquid for stripping off the photoresist.
摘要翻译： 公开了一种用于光致抗蚀剂去除的处理液，其包含（a）氧化剂（例如过氧化氢水溶液），（b）选自碳酸亚烷基酯及其衍生物（例如碳酸亚丙酯）中的至少一种，和（c）水; 以及在干法蚀刻处理之后，处理液处理具有光刻胶膜劣化的基板或在干法蚀刻处理后任选进行等离子体灰化处理的基板的处理液的方法，然后用光致抗蚀剂剥离液 剥离光致抗蚀剂。
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公开(公告)号：US20080280452A1
公开(公告)日：2008-11-13
申请号：US12219120
申请日：2008-07-16
IPC分类号： H01L21/306
CPC分类号： G03F7/425
摘要： Disclosed is a method for stripping a photoresist comprising: (I) providing a photoresist pattern on a substrate where the substrate has at least a copper (Cu) wiring and a low-dielectric layer thereon, and selectively etching the low-dielectric layer by using the photoresist pattern as a mask; (II) contacting the substrate after the step (I), with ozone water and/or aqueous hydrogen peroxide; and (III) contacting the substrate after the step (II), with a photoresist stripping solution that contains at least a quaternary ammonium hydroxide. The present invention provides a method for stripping a photoresist that enables to strip effectively photoresist films and etching residues after etching step even in a process not including an O2 plasma ashing treatment in micropatterning of a substrate having at least Cu wiring and a low-dielectric layer thereon, as in a dual damascene forming process, and, in addition, the method of the invention does not have any negative influence on the dielectric constant of the low-dielectric layer, and ensures an excellent anti-corrosivity.
摘要翻译： 公开了一种剥离光致抗蚀剂的方法，包括：（I）在衬底上提供光致抗蚀剂图案，其中衬底至少具有铜（Cu）布线和其上的低电介质层，并且通过使用选择性地蚀刻低电介质层 光刻胶图案作为掩模; （II）在步骤（I）之后与臭氧水和/或过氧化氢水溶液接触; 和（III）在步骤（II）之后使基底与至少含有氢氧化季铵的光致抗蚀剂剥离溶液接触。 本发明提供了一种剥离光致抗蚀剂的方法，其即使在不包括O 2等离子体灰浆化处理的工艺中，也能够有效地剥离光致抗蚀剂膜和蚀刻残留物，在至少具有至少 Cu布线和其中的低介电层，如在双镶嵌形成工艺中，此外，本发明的方法对低电介质层的介电常数没有任何负面影响，并且确保了优异的抗 - 腐蚀性
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公开(公告)号：US07129020B2
公开(公告)日：2006-10-31
申请号：US10443746
申请日：2003-05-23
IPC分类号： G03F7/11
CPC分类号： G03F7/091
摘要： Disclosed is a liquid coating composition for forming a top antireflective film that contains a polymer, the polymer containing, as a structural unit, a (meth)acrylate unit that has at least one polycyclic hydrocarbon group on its side chain and becomes more soluble to alkali by the action of an acid, the liquid coating composition comprising: (a) a water-soluble, film-forming component; (b) at least one fluorine-based compound selected from a perfluoroalkylcarboxylic acid having 4 or more carbon atoms and a perfluoroalkylsulfonic acid having 5 or more carbon atoms; and (c) a fluoroalkylsulfonic acid having 1–4 carbon atoms and/or an acidic compound consisting of a hydrocarbon having 1–4 carbon atoms in which one or more hydrogen atoms are substituted with a fluoloalkylsulfonyl group(s), with the proviso that one or more carbon atoms therein may be substituted with a nitrogen atom(s).
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公开(公告)号：US20060110690A1
公开(公告)日：2006-05-25
申请号：US11245113
申请日：2005-10-07
IPC分类号： G03G13/00
CPC分类号： H01L21/31133 , G03F7/423
摘要： Disclosed are a treating liquid for photoresist removal, containing (a) an oxidizing agent (e.g., aqueous hydrogen peroxide), (b) at least one selected from alkylene carbonates and their derivatives (e.g., propylene carbonate), and (c) water; and a method for treating with the treating liquid a substrate having a photoresist film deteriorated after dry-etching treatment thereof or a substrate optionally subjected to plasma-ashing treatment after the dry-etching treatment, and then treating it with a photoresist-stripping liquid for stripping off the photoresist.
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28.发明申请公开(公告)号：US20060063688A1
公开(公告)日：2006-03-23
申请号：US11228278
申请日：2005-09-19
IPC分类号： G03F7/42
CPC分类号： G03F7/423
摘要： Disclosed is a photoresist stripping solution comprising: (a) a salt of hydrofluoric acid with a base free from metallic ions; and (b) a water-soluble organic solvent, wherein the content of the component (a) is 0.001 to 0.1 mass % based on the total mass of the photoresist stripping solution. Also disclosed is a method of treating a substrate, which comprises: forming a photoresist film on a substrate; subjecting it to light exposure and then to development; etching thereof with a photoresist pattern as a mask pattern; ashing the mask; and bringing the photoresist stripping solution into contact with the substrate.
摘要翻译： 公开了一种光致抗蚀剂剥离溶液，其包含：（a）氢氟酸与不含金属离子的碱的盐; 和（b）水溶性有机溶剂，其中组分（a）的含量相对于光致抗蚀剂剥离溶液的总质量为0.001〜0.1质量％。 还公开了一种处理衬底的方法，其包括：在衬底上形成光致抗蚀剂膜; 使其曝光，然后进行开发; 用光刻胶图案作为掩模图案进行蚀刻; 灰化面具; 并使光致抗蚀剂剥离溶液与基材接触。
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