公开(公告)号：US20070293023A1

公开(公告)日：2007-12-20

申请号：US11561902

申请日：2006-11-21

Applicant: Yu-Fu Kang ,  Chen-Hsiung Yang

Inventor： Yu-Fu Kang ,  Chen-Hsiung Yang

IPC: H01L21/20

CPC classification number: B81C1/0015 ,  B81C2201/0108 ,  B81C2201/0132

Abstract: A method of fabricating a suspended structure. First, a substrate including a photoresist layer hardened by heat is provided. Subsequently, the hardened photoresist layer is etched so as to turn the photoresist layer into a predetermined edge profile. Thereafter, a structure layer is formed on parts of the substrate and parts of the photoresist layer. Next, a dry etching process is performed so as to remove the photoresist layer, and to turn the structure layer into a suspended structure.

Abstract translation: 一种制造悬挂结构的方法。 首先，提供包含通过热硬化的光致抗蚀剂层的基板。 随后，蚀刻硬化的光致抗蚀剂层，以使光致抗蚀剂层变成预定的边缘轮廓。 此后，在基板的一部分和光致抗蚀剂层的一部分上形成结构层。 接下来，进行干蚀刻处理以去除光致抗蚀剂层，并将结构层转变成悬浮结构。