公开(公告)号：US20170131644A1

公开(公告)日：2017-05-11

申请号：US15321115

申请日：2015-06-01

Applicant: ASML Netherlands B.V.

Inventor： Giovanni Luca GATTOBIGIO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ruud OLIESLAGERS ,  Gerben PIETERSE ,  Cornelius Maria Rops ,  Laurentius Johannes Adrianus VAN BOKHOVEN

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341 ,  G03F7/709

Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.