公开(公告)号：US12032296B2

公开(公告)日：2024-07-09

申请号：US17776369

申请日：2020-10-12

申请人： ASML NETHERLANDS B.V.

发明人： Yang-Shan Huang ,  Nicolaas Ten Kate

IPC分类号： G03F7/00

CPC分类号： G03F7/70341 ,  G03F7/709

摘要： A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

公开(公告)号：US11762304B2

公开(公告)日：2023-09-19

申请号：US15570934

申请日：2016-03-29

申请人： ASML Netherlands B.V.

发明人： Güneş Nak{dot over (i)}boğlu ,  Maarten Holtrust ,  Martinus Van Duijnhoven ,  Francis Fahrni ,  Frank Johannes Jacobus Van Boxtel ,  Anne Willemijn Bertine Quist ,  Bart Dinand Paarhuis ,  Daan Daniel Johannes Antonius Van Sommeren

IPC分类号： G03F7/20 ,  G03F7/00

CPC分类号： G03F7/70858 ,  G03F7/709 ,  G03F7/70308 ,  G03F7/70883 ,  G03F7/70891

摘要： A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

公开(公告)号：US11703770B2

公开(公告)日：2023-07-18

申请号：US17354212

申请日：2021-06-22

申请人： Carl Zeiss SMT GmbH

发明人： Eylem Bektas Knauf ,  Ulrich Schoenhoff ,  Marwène Nefzi ,  Ralf Zweering ,  Konrad Carl Steimer ,  Yim-Bun Patrick Kwan

IPC分类号： G03F7/20 ,  G03F7/00

CPC分类号： G03F7/709 ,  G03F7/70483 ,  G03F7/70825

摘要： An arrangement of a microlithographic optical imaging device includes first and supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device configured to measure the position and/or orientation of the optical element in relation to a reference in at least one degree of freedom and up to all six degrees of freedom in space. A creep compensation device compensates a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

公开(公告)号：US20230195001A1

公开(公告)日：2023-06-22

申请号：US18063410

申请日：2022-12-08

申请人： Semes Co., Ltd.

发明人： Jong Kook Bae ,  Tae Won Yun ,  Chang Ho Kim ,  Hyun Yang Jeong ,  Sung Hun Eom

IPC分类号： G03F7/20

CPC分类号： G03F7/709 ,  G03F7/2041 ,  G03F7/70825

摘要： Disclosed are a buffer unit, in which a plurality of support plates is stacked in a vertical direction and a connection block is provided between the plurality of support plates to prevent vibration generated at the lower end of the support plate from being transmitted from the upper support plate, and a substrate treating apparatus. According to the present invention, it is possible to reduce the vibration generated in the buffer unit, so that there is an effect of improving the efficiency of the substrate treating process.

公开(公告)号：US10054754B2

公开(公告)日：2018-08-21

申请号：US12699767

申请日：2010-02-03

申请人： Michael R. Sogard

发明人： Michael R. Sogard

IPC分类号： G03F7/20 ,  F28D15/00 ,  F28D15/02 ,  G02B7/00 ,  H02J50/10 ,  F24J2/46 ,  F28F13/00 ,  G03B27/54 ,  H02J7/02

CPC分类号： G02B7/008 ,  F24S40/55 ,  F28D15/00 ,  F28D2015/0291 ,  F28F13/00 ,  F28F2013/005 ,  G03B27/54 ,  G03F7/70891 ,  G03F7/709 ,  H02J7/025 ,  H02J50/10 ,  Y02E10/40

摘要： An exemplary thermally regulated component is an optical element or chuck for holding an optical element, or a stage for same, or combination thereof. The component has first and second heat-transfer zones. The first has a first component surface that receives a heating influence such as incident electromagnetic radiation. The second has a second component surface. A conduit circuit extends in the component serially through the first and second heat-transfer zones, back to the first heat-transfer zone, and contains an electrically conductive liquid (e.g., liquid metal). A vibration-free pump (e.g., MFD pump) coupled to the conduit circuit induces flow of the liquid through the circuit. A heat-exchanger is in thermal contact, but not actual contact, with the second component surface. Thus, heat delivered to the second heat-transfer zone by the liquid flowing in the conduit circuit flows from the second component surface to the heat-exchanger. The pump can be powered by a periodically remotely charged power source.

公开(公告)号：US09958793B2

公开(公告)日：2018-05-01

申请号：US14897503

申请日：2014-06-26

申请人： ASML Netherlands B.V. ,  CARL ZEISS SMT GmbH

发明人： Roan Marinus Westerhof ,  Hubertus Luberta Hagenaars ,  Ulrich Schönhoff ,  Adrianus Josephus Petrus Van Engelen

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70141 ,  G03F7/70258 ,  G03F7/70766 ,  G03F7/709

摘要： A lithographic apparatus having a reference body and a positioning system, the positioning system including a main body; a reaction body; an actuator; and a controller. The main body is moveable relative to the reference body along a path in a first direction and a second opposite direction. The reaction body is moveable relative to the main body along a further path in the first and second directions and is moveably connected to the reference body to be moveable relative to the reference body in the first and second directions. The controller provides a first and a second signal to the actuator. The actuator is arranged between the main body and the reaction body to accelerate the main body in the first direction and to accelerate the reaction body in the second direction under control of the first signal, and to accelerate the main body in the second direction and to accelerate the reaction body in the first direction under control of the second signal. The controller determines when the reaction body moves in the second direction and to provide the second signal after the first signal to the actuator when the reaction body moves in the second direction along the further path.

公开(公告)号：US09933707B2

公开(公告)日：2018-04-03

申请号：US13279368

申请日：2011-10-24

申请人： Yim-Bun Patrick Kwan ,  Erik Loopstra

发明人： Yim-Bun Patrick Kwan ,  Erik Loopstra

IPC分类号： G02B7/02 ,  G03F7/20 ,  G02B5/00 ,  G02B13/14

CPC分类号： G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

摘要： An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

公开(公告)号：US09921496B2

公开(公告)日：2018-03-20

申请号：US14981630

申请日：2015-12-28

申请人： NIKON CORPORATION

发明人： Yasuo Aoki

IPC分类号： G03B27/58 ,  G03F7/20 ,  H02K41/03 ,  F16C39/04 ,  F16C39/06 ,  F16C29/00 ,  H02K7/09 ,  H02K16/00

CPC分类号： G03F7/70775 ,  F16C29/008 ,  F16C39/04 ,  F16C39/06 ,  G03F7/70716 ,  G03F7/70816 ,  G03F7/709 ,  H02K7/09 ,  H02K16/00 ,  H02K41/031 ,  H02K2201/18

摘要： In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.

公开(公告)号：US20180059555A1

公开(公告)日：2018-03-01

申请号：US15558552

申请日：2016-02-22

申请人： ASML Netherlands B.V.

发明人： Jan Steven Christiaan WESTERLAKEN ,  Marcel Koenraad Marie BAGGEN ,  Fransiscus Mathijs JACOBS ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Marc Wilhelmus Maria VAN DER WIJST

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70775 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/709 ,  G03F9/70 ,  G03F9/7046

摘要： A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.

公开(公告)号：US09904175B2

公开(公告)日：2018-02-27

申请号：US14937340

申请日：2015-11-10

申请人： Carl Zeiss SMT GmbH

发明人： Jens Kugler ,  Stefan Hembacher ,  Michaela Schmid

IPC分类号： G03B27/42 ,  G03F7/20 ,  G02B7/182

CPC分类号： G03F7/7015 ,  G02B7/1828 ,  G03F7/70258 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

摘要： An EUV imaging apparatus is provided, which includes a reference structure and a first optical element, which is actuatable relative to the reference structure with the aid of a first actuator. The first actuator is a self-holding actuator. The apparatus includes a second optical element, which is actuatable relative to the reference structure a second actuator. The second actuator is a non-self-holding actuator.