利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

25 条记录 (耗时 0.039 秒)

    Method Of Forming Open-Network Polishing Pads
    21.
    发明申请
    Method Of Forming Open-Network Polishing Pads 有权
    形成开放网络抛光垫的方法

    公开(公告)号：US20130075362A1

    公开(公告)日：2013-03-28

    申请号：US13239951

    申请日：2011-09-22

    申请人： Hamed Lakrout ,  Ben W. Schaefer ,  Michael D. Williams

    发明人： Hamed Lakrout ,  Ben W. Schaefer ,  Michael D. Williams

    IPC分类号： C23F1/02

    CPC分类号： B24B37/22 ,  B24B37/26 ,  B24D11/003

    摘要： The method forms forming an open-network polishing pad useful for polishing magnetic, semiconductor and optical substrates. The method provides a polymer sheet or film of a curable polymer and exposes the polymer sheet or film to an energy source to create an exposure pattern in the polymer sheet or film. The exposure pattern having elongated sections exposed to the energy source. After attaching the polymer sheet or film to an open-network substrate, the method removes polymer adjacent from the exposed polymer sheet or film of the intermediate structure with a solvent. This forms elongated channels through the polymer sheet or film in a texture pattern that corresponds to the exposure pattern with the open-network supporting the polymer. The elongated channels extending through the thickness of the polymer sheet or film to form the open-network polishing pad.

    摘要翻译： 该方法形成用于抛光磁性，半导体和光学衬底的开放网络抛光垫。 该方法提供可固化聚合物的聚合物片材或膜，并将聚合物片材或膜暴露于能量源，以在聚合物片材或膜中产生曝光图案。 曝光图案具有暴露于能量源的细长部分。 在将聚合物片或膜连接到开放网络基板上之后，该方法用溶剂除去与暴露的聚合物片或中间结构的膜相邻的聚合物。 这形成通过聚合物片材或膜的细长通道，其以对应于曝光图案的纹理图案与支撑聚合物的开放网络形成。 细长通道延伸穿过聚合物片或薄膜的厚度以形成开放式网状抛光垫。

    Method Of Forming Layered-Open-Network Polishing Pads
    22.
    发明申请
    Method Of Forming Layered-Open-Network Polishing Pads 有权
    形成分层开放网络抛光垫的方法

    公开(公告)号：US20130075016A1

    公开(公告)日：2013-03-28

    申请号：US13240007

    申请日：2011-09-22

    申请人： Hamed Lakrout

    发明人： Hamed Lakrout

    IPC分类号： B32B3/10

    CPC分类号： B24B37/22 ,  B24B37/26 ,  B24D11/003

    摘要： The method forms a layered-open-network polishing pad useful for polishing at least one of magnetic, semiconductor and optical substrates. Exposing a first and second polymer sheet or film of a curable polymer to an energy source creates an exposure pattern in the first and second polymer sheet, the exposure pattern having elongated sections exposed to the energy source. Then removing polymer from the exposed first and second polymer sheets to forms elongated channels through the first and second polymer sheets in a channel pattern that corresponds to the exposure pattern. Attaching the first and second polymer sheets forms a polishing pad, the patterns of the first and second polymer sheets cross wherein the first polymer sheet supports the second polymer sheet and the elongated channels from the first and second polymer sheets connect and to form the layered-open-network polishing pad.

    摘要翻译： 该方法形成用于抛光磁性，半导体和光学衬底中的至少一种的分层开放网络抛光垫。 将可固化聚合物的第一和第二聚合物片或薄膜暴露于能量源，在第一和第二聚合物片中产生曝光图案，曝光图案具有暴露于能量源的细长部分。 然后从曝光的第一和第二聚合物片材中除去聚合物以通过对应于曝光图案的通道图案通过第一和第二聚合物片材形成细长通道。 连接第一和第二聚合物片材形成抛光垫，第一和第二聚合物片材的图案交叉，其中第一聚合物片材支撑第二聚合物片材，并且来自第一和第二聚合物片材的细长通道连接并形成层状 - 开网抛光垫。