Abstract:
Methods and structures for programmable device fabrication are provided. The methods for fabricating a programmable device include, for example forming at least one via opening in a layer of the programmable device and providing a catalyzing material over a lower surface of the at least one via opening; forming a plurality of nanowires or nanotubes in the at least one via opening using the catalyzing material as a catalyst for the forming of the plurality of nanowires or nanotubes; and providing a dielectric material in the at least one via opening so that the dielectric material surrounds the plurality of nanowires or nanotubes. The programmable device may, in subsequent or separate programming steps, have programming of the programmable device made permanent via thermal oxidation of the dielectric material and the plurality of nanowires or nanotubes, leaving a non-conducting material behind in the at least one via opening.