公开(公告)号：US20050003136A1

公开(公告)日：2005-01-06

申请号：US10860713

申请日：2004-06-03

申请人： Junji Kurachi ,  Akihiro Koyama

发明人： Junji Kurachi ,  Akihiro Koyama

IPC分类号： C03C3/085 ,  B32B3/02

CPC分类号： C03C3/085

摘要： The present invention provides a glass composition that has excellent heat resistance and ion exchange ability and can be provided with high strength by a chemical strengthening treatment through an ion exchange. This glass composition includes, in terms of mass %: 59 to 68% of SiO2; 9.5 to 15% of Al2O3; 0 to 1% of Li2O; 3 to 18% of Na2O; 0 to 3.5% of K2O; 0 to 15% of MgO; 1 to 15% of CaO; 0 to 4.5% of SrO; 0 to 1% of BaO; 0 to 2% of TiO2; and 1 to 10% of ZrO2. The glass composition of the present invention is suitable for a glass substrate for magnetic recording media and also can be formed as a chemically strengthened glass article through an ion-exchange treatment.

摘要翻译： 本发明提供了具有优异的耐热性和离子交换能力的玻璃组合物，并且可以通过离子交换通过化学强化处理而具有高强度。 该玻璃组合物以质量％计含有：59〜68％的SiO 2; 9.5〜15％的Al2O3; 0〜1％的Li2O; 3〜18％的Na2O; 0〜3.5％K2O; 0〜15％的MgO; 1〜15％的CaO; 0〜4.5％的SrO; 0〜1％的BaO; 0〜2％的TiO2; 和1〜10％的ZrO 2。 本发明的玻璃组合物适用于磁记录介质用玻璃基板，也可以通过离子交换处理形成为化学强化玻璃制品。

公开(公告)号：US20100298112A1

公开(公告)日：2010-11-25

申请号：US12801570

申请日：2010-06-15

申请人： Junji Kurachi ,  Akihiro Koyama ,  Yoichi Hachitani

发明人： Junji Kurachi ,  Akihiro Koyama ,  Yoichi Hachitani

IPC分类号： C03C3/091 ,  C03B17/06

CPC分类号： C03C3/091 ,  Y10T428/1095

摘要： A glass substrate for a display, which is formed of a glass having a light weight and having high refinability with decreasing environmental burdens, the glass comprising, by mass %, 50 to 70% of SiO2, 5 to 18% of B2O3, 10 to 25% of Al2O3, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 5 to 20% of RO (in which R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba), and over 0.20% but not more than 2.0% of R′2O (in which R′ is at least one member selected from the group consisting of Li, Na and K), and containing, by mass %, 0.05 to 1.5% of oxide of metal that changes in valence number in a molten glass, and substantially containing none of As2O3, Sb2O3 and PbO.

摘要翻译： 一种显示器用玻璃基板，其由重量轻且具有降低的环境负荷的高可熔性的玻璃形成，所述玻璃以质量％计含有50〜70％的SiO 2，5〜18％的B 2 O 3，10〜 25％的Al 2 O 3，0〜10％的MgO，0〜20％的CaO，0〜20％的SrO，0〜10％的BaO，5〜20％的RO（其中R为选自 由Mg，Ca，Sr和Ba组成的组）和超过0.20％但不超过2.0％的R'2O（其中R'为选自Li，Na和K中的至少一种）， 并且以质量％计含有熔融玻璃中价数变化的金属氧化物的0.05〜1.5％，并且基本上不含有As 2 O 3，Sb 2 O 3和PbO。

公开(公告)号：US07763559B2

公开(公告)日：2010-07-27

申请号：US12071063

申请日：2008-02-14

申请人： Junji Kurachi ,  Akihiro Koyama ,  Yoichi Hachitani

发明人： Junji Kurachi ,  Akihiro Koyama ,  Yoichi Hachitani

IPC分类号： C03C3/091 ,  C03C3/093

CPC分类号： C03C3/091 ,  Y10T428/1095

摘要： A glass substrate for a display, which is formed of a glass having a light weight and having high refinability with decreasing environmental burdens, the glass comprising, by mass %, 50 to 70% of SiO2, 5 to 18% of B2O3, 10 to 25% of Al2O3, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 5 to 20% of RO (in which R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba), and over 0.20% but not more than 2.0% of R′2O (in which R′ is at least one member selected from the group consisting of Li, Na and K), and containing, by mass %, 0.05 to 1.5% of oxide of metal that changes in valence number in a molten glass, and substantially containing none of As2O3, Sb2O3 and PbO.

公开(公告)号：US07407889B2

公开(公告)日：2008-08-05

申请号：US10993587

申请日：2004-11-19

申请人： Keiji Tsunetomo ,  Shinya Okamoto ,  Yasuhiro Saito ,  Junji Kurachi ,  Akihiro Koyama ,  Hirotaka Koyo ,  Takeshi Hidaka ,  Hiroaki Kasai ,  Masamichi Hijino ,  Yasushi Nakamura

发明人： Keiji Tsunetomo ,  Shinya Okamoto ,  Yasuhiro Saito ,  Junji Kurachi ,  Akihiro Koyama ,  Hirotaka Koyo ,  Takeshi Hidaka ,  Hiroaki Kasai ,  Masamichi Hijino ,  Yasushi Nakamura

IPC分类号： H01L21/311

CPC分类号： C03C17/001 ,  C03C2217/77 ,  C03C2218/33

摘要： The present invention improves a method of forming a surface unevenness using a difference in etching rates, and relaxes limitations on substrates in this method. In a method of the present invention, an uneven surface is formed by a method including applying pressure to a predetermined region in a surface of a thin film formed on a substrate, and etching a region including at least a portion of the predetermined region and at least a portion of the reminder of the surface that excludes the predetermined region. An etching rate difference within the thin film increases freedom in selecting a substrate material.

摘要翻译： 本发明改进了使用蚀刻速率差异形成表面凹凸的方法，并且在该方法中放宽了对基板的限制。 在本发明的方法中，通过包括对形成在基板上的薄膜的表面中的规定区域施加压力的方法形成凹凸表面，并且蚀刻包含至少一部分预定区域的区域和 排除了预定区域的表面的提醒的至少一部分。 薄膜内的蚀刻速率差增加了选择衬底材料的自由度。

公开(公告)号：US20080090717A1

公开(公告)日：2008-04-17

申请号：US11793171

申请日：2005-12-15

申请人： Yukihito Nagashima ,  Haruki Niida ,  Junji Kurachi ,  Akihiro Koyama ,  Hiromitsu Seto ,  Kazuhiro Yamamoto ,  Daisuke Miyabe ,  Yutaka Senshu

发明人： Yukihito Nagashima ,  Haruki Niida ,  Junji Kurachi ,  Akihiro Koyama ,  Hiromitsu Seto ,  Kazuhiro Yamamoto ,  Daisuke Miyabe ,  Yutaka Senshu

IPC分类号： C03C3/11

CPC分类号： C03C3/11 ,  C03C3/091 ,  G02F2001/133302

摘要： The present invention provides a glass composition in which a smaller amount of arsenic oxide or antimony oxide that has a heavy burden on the environment is used and fewer bubbles remain. This glass composition includes, in terms of mass %: 40 to 70% of SiO2, 5 to 20% of B2O3, 10 to 25% of Al2O3, 0 to 5% of MgO (up to and not including 5%), 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 0 to 1.5% of Li2O, 0 to 1.5% of Na2O, 0 to 1.5% of K2O, and 0 to 1.5% of Cl. The sum of the contents of Li2O, Na2O, and K2O is 0.05 to 1.5 mass %, and the content of K2O is equal to or larger than that of Na2O.

摘要翻译： 本发明提供一种玻璃组合物，其中使用较少量的环境负担较重的氧化亚砷或氧化锑，并且保留较少的气泡。 该玻璃组合物以质量％计含有40〜70％的SiO 2，5〜20％的B 2 O 3 3， 10〜25％的Al 2 O 3 3，0〜5％的MgO（不高于5％），0〜20％的CaO，0〜20 0％的BaO，0〜1.5％的Li 2 O，0〜1.5％的Na 2 O，0〜1.5％的K 2， SUB> 2 O，0〜1.5％的Cl。 Li 2 O，Na 2 O和K 2 O 2的含量之和为0.05〜1.5质量％，含量为 K 2 O等于或大于Na 2 O的O 2。

公开(公告)号：US20070270300A1

公开(公告)日：2007-11-22

申请号：US11793169

申请日：2005-12-13

申请人： Junji Kurachi ,  Akihiro Koyama

发明人： Junji Kurachi ,  Akihiro Koyama

IPC分类号： C03C3/11 ,  G09F9/30

CPC分类号： C03C3/091 ,  C03C3/11 ,  G02F2001/133302

摘要： The glass composition of the present invention includes the following components, expressed in mass%: 70% to 88% of SiO2; 6% to 18% of B2O3; 0.5% to 4.5% of Al2O3; 0% to 0.5% of Li2O; 0% to 0.5% of Na2O; 2% to 10% of K2O; and 0% to 2% of MgO+CaO+SrO+BaO, and the glass composition further includes chlorine (Cl). The glass composition of the present invention is used suitably as a glass substrate for an information display device.

摘要翻译： 本发明的玻璃组合物包含以质量％表示的以下组分：70％〜88％的SiO 2; 6％至18％的B 2 O 3 3; 0.5％至4.5％的Al 2 O 3 3; 0％至0.5％的Li 2 O; 0％至0.5％的Na 2 O; 2％至10％的K 2 O; 和0〜2％的MgO + CaO + SrO + BaO，玻璃组合物还含有氯（Cl）。 本发明的玻璃组合物适合用作信息显示装置的玻璃基板。

公开(公告)号：US20050130426A1

公开(公告)日：2005-06-16

申请号：US10993422

申请日：2004-11-19

申请人： Takeshi Hidaka ,  Hiroaki Kasai ,  Masamichi Hijino ,  Yasushi Nakamura ,  Akihiro Koyama ,  Keiji Tsunetomo ,  Junji Kurachi ,  Hirotaka Koyo ,  Shinya Okamoto ,  Yasuhiro Saito

发明人： Takeshi Hidaka ,  Hiroaki Kasai ,  Masamichi Hijino ,  Yasushi Nakamura ,  Akihiro Koyama ,  Keiji Tsunetomo ,  Junji Kurachi ,  Hirotaka Koyo ,  Shinya Okamoto ,  Yasuhiro Saito

IPC分类号： C03C15/00 ,  C03C17/22 ,  C03C17/34 ,  C03C19/00 ,  C03C23/00 ,  G11B5/84 ,  H01L21/44 ,  B65G49/07 ,  H01L21/302 ,  H01L21/461

CPC分类号： C03C23/007 ,  C03C15/00 ,  C03C17/22 ,  C03C17/3411 ,  C03C19/00 ,  C03C2218/31 ,  C03C2218/32 ,  G11B5/7315 ,  G11B5/8404 ,  Y10T428/218 ,  Y10T428/24355

摘要： A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof, and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

摘要翻译： 本发明的玻璃基板的加工方法包括：向玻璃基板施加热和外力，然后将其冷却，从而形成与蚀刻剂相对于其它部分的蚀刻速率不同的压缩应力部分， 在玻璃基板的表面及其附近，使用在其上形成有压缩应力部的玻璃基板上的蚀刻剂进行化学蚀刻，以在玻璃基板的表面上形成凸版。

公开(公告)号：US08383530B2

公开(公告)日：2013-02-26

申请号：US12801570

申请日：2010-06-15

申请人： Junji Kurachi ,  Akihiro Koyama ,  Yoichi Hachitani

发明人： Junji Kurachi ,  Akihiro Koyama ,  Yoichi Hachitani

IPC分类号： C03C3/091 ,  C03C3/093 ,  C03B17/00 ,  C03B5/225

CPC分类号： C03C3/091 ,  Y10T428/1095

摘要： A glass substrate for a display, which is formed of a glass having a light weight and having high refinability with decreasing environmental burdens, the glass comprising, by mass %, 50 to 70% of SiO2, 5 to 18% of B2O3, 10 to 25% of Al2O3, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 5 to 20% of RO (in which R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba), and over 0.20% but not more than 2.0% of R′2O (in which R′ is at least one member selected from the group consisting of Li, Na and K), and containing, by mass %, 0.05 to 1.5% of oxide of metal that changes in valence number in a molten glass, and substantially containing none of As2O3, Sb2O3 and PbO.

摘要翻译： 一种显示器用玻璃基板，其由重量轻且具有降低的环境负荷的高可熔性的玻璃形成，所述玻璃以质量％计含有50〜70％的SiO 2，5〜18％的B 2 O 3，10〜 25％的Al 2 O 3，0〜10％的MgO，0〜20％的CaO，0〜20％的SrO，0〜10％的BaO，5〜20％的RO（其中R为选自 由Mg，Ca，Sr和Ba组成的组）和超过0.20％但不超过2.0％的R'2O（其中R'为选自Li，Na和K中的至少一种）， 并且以质量％计含有熔融玻璃中价数变化的金属氧化物的0.05〜1.5％，并且基本上不含有As 2 O 3，Sb 2 O 3和PbO。

公开(公告)号：US07354526B2

公开(公告)日：2008-04-08

申请号：US10993422

申请日：2004-11-19

申请人： Takeshi Hidaka ,  Hiroaki Kasai ,  Masamichi Hijino ,  Yasushi Nakamura ,  Akihiro Koyama ,  Keiji Tsunetomo ,  Junji Kurachi ,  Hirotaka Koyo ,  Shinya Okamoto ,  Yasuhiro Saito

发明人： Takeshi Hidaka ,  Hiroaki Kasai ,  Masamichi Hijino ,  Yasushi Nakamura ,  Akihiro Koyama ,  Keiji Tsunetomo ,  Junji Kurachi ,  Hirotaka Koyo ,  Shinya Okamoto ,  Yasuhiro Saito

IPC分类号： B44C1/22

CPC分类号： C03C23/007 ,  C03C15/00 ,  C03C17/22 ,  C03C17/3411 ,  C03C19/00 ,  C03C2218/31 ,  C03C2218/32 ,  G11B5/7315 ,  G11B5/8404 ,  Y10T428/218 ,  Y10T428/24355

摘要： A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof, and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

摘要翻译： 本发明的玻璃基板的加工方法包括：向玻璃基板施加热和外力，然后将其冷却，从而形成与蚀刻剂相对于其它部分的蚀刻速率不同的压缩应力部分， 在玻璃基板的表面及其附近，使用在其上形成有压缩应力部的玻璃基板上的蚀刻剂进行化学蚀刻，以在玻璃基板的表面上形成凸版。

公开(公告)号：US20070138130A1

公开(公告)日：2007-06-21

申请号：US10589548

申请日：2005-02-04

申请人： Junji Kurachi ,  Akihiro Koyama ,  Shinya Okamoto ,  Yasuhiro Saito ,  Keiji Tsunetomo ,  Hirotaka Koyo ,  Takeshi Hidaka ,  Hiroaki Kasai ,  Yasushi Nakamura

发明人： Junji Kurachi ,  Akihiro Koyama ,  Shinya Okamoto ,  Yasuhiro Saito ,  Keiji Tsunetomo ,  Hirotaka Koyo ,  Takeshi Hidaka ,  Hiroaki Kasai ,  Yasushi Nakamura

IPC分类号： B44C1/22

CPC分类号： C03C3/091 ,  C03C15/00 ,  C03C19/00 ,  G11B5/7315 ,  G11B5/8404

摘要： The present invention provides a glass substrate having a minute texture being provided on the surface and having good acid durability with high protrusion forming efficiency. According to the present invention, unevenness is formed on the surface by pressing a predetermined area of the surface of the glass substrate containing at least one oxide selected from the group consisting of SiO2, B2O3, P2O5, GeO2, As2O5, ZrO2, TiO2, SnO2, A2O3, MgO, and BeO and having a composition wherein the content of this at least one oxide is above 90 mol %, and subsequently by etching an area including this predetermined area. In the composition of this glass substrate, the ratio of oxides of network formers or intermediates is high, so that the glass substrate becomes easy to be compressed. This enables to obtain high protrusion forming efficiency even when selective leaching of a component easily leached into etchant is not employed, thereby satisfying acid durability as well.

摘要翻译： 本发明提供一种具有微细纹理的玻璃基板，其表面具有良好的酸性耐久性和高的突起形成效率。 根据本发明，通过按压包含至少一种选自SiO 2，B 2的氧化物的玻璃基板的表面的规定区域，在表面上形成凹凸 3，O 3，O 2，O 2，O 2，O 2， O 2，ZrO 2，TiO 2，SnO 2，A 2，N 2， 具有其中所述至少一种氧化物的含量高于90mol％的组成，随后通过蚀刻包括该预定区域的区域的组成。 在该玻璃基板的组成中，网络形成体或中间体的氧化物的比例高，玻璃基板容易被压缩。 即使不使用容易浸出到蚀刻剂中的成分的选择性浸出，也能够获得高的突起形成效率，因此也能够得到耐酸性。