公开(公告)号：US20170352146A1

公开(公告)日：2017-12-07

申请号：US15367076

申请日：2016-12-01

Applicant: KLA-Tencor Corporation

Inventor： Santosh Bhattacharyya

IPC: G06T7/00

CPC classification number: G06T7/0006 ,  G06T7/001 ,  G06T7/33 ,  G06T2207/10004 ,  G06T2207/20101 ,  G06T2207/30148

Abstract: A system, method, and computer program product are provided for automatically generating a wafer image to design coordinate mapping. In use, a design of a wafer is received by a computer processor. In addition, an image of a wafer fabricated from the design is received by the computer processor. Further, a coordinate mapping between the design and the image is automatically generated by the computer processor.

公开(公告)号：US20170186151A1

公开(公告)日：2017-06-29

申请号：US15355606

申请日：2016-11-18

Applicant: KLA-Tencor Corporation

Inventor： Saibal Banerjee ,  Ashok Kulkarni ,  Jagdish Saraswatula ,  Santosh Bhattacharyya

IPC: G06T7/00

CPC classification number: G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: Shape primitives are used for inspection of a semiconductor wafer or other workpiece. The shape primitives can define local topological and geometric properties of a design. One or more rules are applied to the shape primitives. The rules can indicate presence of a defect or the likelihood of a defect being present. A rule execution engine can search for an occurrence of the shape primitives covered by the at least one rule.