公开(公告)号：US09764986B2

公开(公告)日：2017-09-19

申请号：US14602745

申请日：2015-01-22

Applicant: Kennametal Inc.

Inventor： Zhenyu Liu ,  Qingjun Zheng ,  Peter Rudolf Leicht ,  Yixiong Liu

IPC: C23C16/34 ,  C04B35/58

CPC classification number: C04B35/58014 ,  C23C16/34

Abstract: In one aspect, articles employing CVD coatings deposited at low temperatures are described herein. Briefly, a coated article described herein comprises a substrate and a refractory coating adhered to the substrate, the refractory coating including a layer of TiN deposited by thermal CVD, the layer of TiN having an average crystallite size of 0.05 μm to 0.5 μm and residual tensile stress of 100 MPa to 700 MPa.

公开(公告)号：US20160215387A1

公开(公告)日：2016-07-28

申请号：US14602745

申请日：2015-01-22

Applicant: Kennametal Inc.

Inventor： Zhenyu LIU ,  Qingjun Zheng ,  Peter Rudolf Leicht ,  Yixiong Liu

IPC: C23C16/06 ,  C04B35/58 ,  C23C16/44

CPC classification number: C04B35/58014 ,  C23C16/34

Abstract: In one aspect, articles employing CVD coatings deposited at low temperatures are described herein. Briefly, a coated article described herein comprises a substrate and a refractory coating adhered to the substrate, the refractory coating including a layer of TiN deposited by thermal CVD, the layer of TiN having an average crystallite size of 0.05 μm to 0.5 μm and residual tensile stress of 100 MPa to 700 MPa.

Abstract translation: 在一个方面，本文描述了使用在低温下沉积的CVD涂层的制品。 简而言之，本文描述的涂覆制品包括基底和粘附到基底的耐火涂层，耐火涂层包括通过热CVD沉积的TiN层，所述TiN层具有0.05μm至0.5μm的平均微晶尺寸和残余拉伸强度 应力为100MPa至700MPa。