公开(公告)号：US09541900B2

公开(公告)日：2017-01-10

申请号：US14140914

申请日：2013-12-26

申请人： LG Display Co., Ltd. ,  Bayer MaterialScience AG

发明人： Hyungseok Bang ,  Heejin Im ,  Guensik Lee ,  Friedrich-Karl Bruder ,  Thomas Peter Fäcke ,  Marc-Stephan Weiser ,  Rainer Hagen ,  Thomas Rölle ,  Horst Berneth ,  Dennis Hönel ,  Günther Walze

IPC分类号： G03F1/20 ,  G03H1/20 ,  G02B27/09 ,  G03H1/02 ,  G03H1/04 ,  G02B27/01 ,  G02B5/02 ,  G02B5/32

CPC分类号： G03H1/20 ,  G02B5/0252 ,  G02B5/0278 ,  G02B5/32 ,  G02B27/0103 ,  G02B27/0944 ,  G03H1/02 ,  G03H1/0402 ,  G03H2001/0264 ,  G03H2001/0439 ,  G03H2222/18

摘要： The present disclosure relates to a method for producing a beam shaping holographic optical element, which is configured to generate diffracted beams configured to reconstruct an image of a diffusor irrespectively of the point of impact of a pencil of light on the beam shaping holographic optical element, comprising providing a recording element, providing a master element comprising a particular pattern, forming a recording stack comprising the recording element and the master element such that the master element is arranged to the recording element in a closed-copy distance, irradiating at least a part of the recording stack with a reconstruction beam, irradiating at least a part of the recording stack with a reference beam, wherein at least one of the reconstruction beam or reference beam penetrates the master element to record the pattern of the master element onto the recording element.

摘要翻译： 本公开涉及一种用于制造光束成形全息光学元件的方法，其被配置为产生衍射光束，所述衍射光束被配置为重建漫射器的图像，而不管光束的影响点在光束成形全息光学元件上， 包括提供记录元件，提供包括特定图案的主元件，形成包括所述记录元件和所述主元件的记录堆叠，使得所述主元件以闭合复印距离布置到所述记录元件，照射至少一部分 具有重建光束的记录堆叠，用参考光束照射至少一部分记录堆叠，其中重建光束或参考光束中的至少一个穿透主元件以将主元件的图案记录到记录元件上 。