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公开(公告)号:US4696886A
公开(公告)日:1987-09-29
申请号:US748064
申请日:1985-06-24
申请人: Makoto Hanabata , Akihiro Furuta , Seimei Yasui , Kunihiko Tanaka
发明人: Makoto Hanabata , Akihiro Furuta , Seimei Yasui , Kunihiko Tanaka
CPC分类号: G03F7/0233
摘要: A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer and as a photo-sensitizer a quinonediazide compound is disclosed. A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer, a novolak resin, and as a photo-sensitizer a quinonediazide compound, is also disclosed.