MEMS device and method for calibrating a MEMS device

    公开(公告)号:US10683202B2

    公开(公告)日:2020-06-16

    申请号:US15810386

    申请日:2017-11-13

    Applicant: NXP USA, Inc.

    Abstract: A microelectromechanical systems (MEMS) device and a method for calibrating a MEMS device. The device includes a first semiconductor substrate including at least one MEMS component. The device also includes an application specific integrated circuit (ASIC) comprising a second semiconductor substrate. The second semiconductor substrate is attached to the first semiconductor substrate. The second semiconductor substrate includes at least one piezoresistive strain gauge. Each piezoresistive strain gauge includes at least one doped semiconductor region having a resistivity that is determined by a strain on said doped semiconductor region. The second semiconductor substrate also includes a circuit for evaluating a trim algorithm for the at least one MEMs component using one or more output values received from the at least one piezoresistive strain gauge.

    MEMS ANGULAR RATE SENSOR WITH IN-PHASE DRIVE AND SENSE MOTION SUPPRESSION

    公开(公告)号:US20190383612A1

    公开(公告)日:2019-12-19

    申请号:US16010783

    申请日:2018-06-18

    Applicant: NXP USA, Inc.

    Abstract: A MEMS device includes first, second, third, and fourth sense masses spaced apart from a surface of a substrate. A first drive coupler interconnects the first sense mass with a first actuator, a second drive coupler interconnects the second sense mass with a second actuator, a third drive coupler interconnects the third sense mass with a third actuator, and a fourth drive coupler interconnects the fourth sense mass with a fourth actuator. Each of the drive couplers includes a torsion bar having a length aligned parallel to an outer sidewall of an adjacent sense mass and first and second coupling links coupled to opposing first and second ends of the torsion bar. The first and second coupling links couple an adjacent one of the first, second, third, and fourth sense masses with a corresponding one of the first, second, third, and fourth actuators.

    MEMS DEVICE AND METHOD FOR CALIBRATING A MEMS DEVICE

    公开(公告)号:US20180141805A1

    公开(公告)日:2018-05-24

    申请号:US15810386

    申请日:2017-11-13

    Applicant: NXP USA, Inc.

    Abstract: A microelectromechanical systems (MEMS) device and a method for calibrating a MEMS device. The device includes a first semiconductor substrate including at least one MEMS component. The device also includes an application specific integrated circuit (ASIC) comprising a second semiconductor substrate. The second semiconductor substrate is attached to the first semiconductor substrate. The second semiconductor substrate includes at least one piezoresistive strain gauge. Each piezoresistive strain gauge includes at least one doped semiconductor region having a resistivity that is determined by a strain on said doped semiconductor region. The second semiconductor substrate also includes a circuit for evaluating a trim algorithm for the at least one MEMs component using one or more output values received from the at least one piezoresistive strain gauge.

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