公开(公告)号：US11322346B2

公开(公告)日：2022-05-03

申请号：US17336924

申请日：2021-06-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yeongbong Park ,  Jisu Kim ,  Byoungho Kwon

IPC: H01L21/02 ,  H01L21/306 ,  B08B3/02 ,  B08B3/08 ,  B05B1/14 ,  B08B1/00 ,  B08B1/04 ,  B08B1/02 ,  B24B37/34 ,  B08B3/04

Abstract: A method of processing a substrate may include preparing the substrate, polishing the substrate, and cleaning the substrate using a double nozzle, which is configured to provide a spray and a chemical solution onto the substrate. The spray may include a deionized water, and the chemical solution may be diluted with the deionized water. The chemical solution and the spray may be spaced apart from each other by a distance of 7 cm to 12 cm.

公开(公告)号：US20190034624A1

公开(公告)日：2019-01-31

申请号：US15870619

申请日：2018-01-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Xun Chen ,  Seonghun Moon ,  HyungDeuk Kim ,  Jisu Kim

IPC: G06F21/55 ,  G06F21/44

Abstract: An apparatus includes a display, a processor coupled to the display and a memory coupled to the processor, wherein the memory includes instructions executable by the processor to identify an access attempt to a monitored resource by an application, the identification occurring after an access permission check is performed. The memory further includes instructions executable by the processor to determine whether the access attempt involves suspicious activity by evaluating a potential risk associated with the application accessing the monitored resource, and in response to determining that the access attempt involves suspicious activity to provide a graphical user interface (GUI) to the display, the GUI providing a notification of the access attempt.