公开(公告)号：US10768527B2

公开(公告)日：2020-09-08

申请号：US16102429

申请日：2018-08-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Chung Su ,  Kuan-Hsin Lo ,  Yahru Cheng ,  Ching-Yu Chang ,  Chin-Hsiang Lin

IPC: G03F7/16 ,  G03F7/20 ,  G03F7/09 ,  H01L21/027

Abstract: A method includes providing a photoresist solution that includes a first solvent having a first volume and a second solvent having a second volume, where the first solvent is different from the second solvent and where the first volume is less than the second volume; dispersing the photoresist solution over a substrate to form a film, where the dispersing evaporates a portion of the first solvent and a portion of the second solvent such that a remaining portion of the first solvent is greater than a remaining portion of the second solvent; baking the film; after baking the film, exposing the film to form an exposed film; and developing the exposed film.

公开(公告)号：US20200050110A1

公开(公告)日：2020-02-13

申请号：US16102429

申请日：2018-08-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Chung Su ,  Kuan-Hsin Lo ,  Yahru Cheng ,  Ching-Yu Chang ,  Chin-Hsiang Lin

IPC: G03F7/16 ,  H01L21/027 ,  G03F7/09 ,  G03F7/20

Abstract: A method includes providing a photoresist solution that includes a first solvent having a first volume and a second solvent having a second volume, where the first solvent is different from the second solvent and where the first volume is less than the second volume; dispersing the photoresist solution over a substrate to form a film, where the dispersing evaporates a portion of the first solvent and a portion of the second solvent such that a remaining portion of the first solvent is greater than a remaining portion of the second solvent; baking the film; after baking the film, exposing the film to form an exposed film; and developing the exposed film.