Hierarchical Wafer Yield Prediction Method and Hierarchical Lifetime Prediction Method
    21.
    发明申请
    Hierarchical Wafer Yield Prediction Method and Hierarchical Lifetime Prediction Method 有权
    分层晶圆产量预测方法和分层寿命预测方法

    公开(公告)号:US20140089871A1

    公开(公告)日:2014-03-27

    申请号:US14099997

    申请日:2013-12-08

    CPC classification number: G01R31/2642 G06F17/50 H01L22/14 H01L22/20

    Abstract: For improving wafer fabrication, yield and lifetime of wafers are predicted by determining coefficients of a yield domain for wafer yield prediction and a lifetime domain for a wafer lifetime prediction, an integral domain, an electric/layout domain, a metrology/defect domain, and a machine sensor domain in a hierarchical manner. With the aid of the hierarchically-determined coefficients, noises in prediction can be reduced so that precision of prediction results of the yields or the lifetimes of wafers can be raised.

    Abstract translation: 为了改善晶片制造,通过确定晶片产量预测的屈服域的系数和晶片寿命预测的寿命域,整合域,电/布局域,计量/缺陷域和 机器传感器域以分层方式。 借助于层次确定的系数,可以减少预测中的噪声,从而可以提高晶片的产量或寿命的预测结果的精度。

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