公开(公告)号：US07060978B2

公开(公告)日：2006-06-13

申请号：US09808714

申请日：2001-03-14

Applicant: Volker Drexel ,  Johannes Bihr ,  Gerd Benner ,  Stephan Kujawa

Inventor： Volker Drexel ,  Johannes Bihr ,  Gerd Benner ,  Stephan Kujawa

IPC: H01J37/28

CPC classification number: H01J37/244

Abstract: A detector system for a particle beam apparatus, in particular for a scanning electron microscope, has a target structure, which in a central region near the optical axis includes an electron-converting material. The target structure also includes either a non-converting material in a region remote from the optical axis or the region remote from the optical axis is offset in the direction of the optical axis with respect to the region near the optical axis that includes the electron-converting material. The detector system makes possible separate detection of only back-scattered electrons or only secondary electrons.