公开(公告)号：US2293177A

公开(公告)日：1942-08-18

申请号：US32185240

申请日：1940-03-02

Applicant: BEIL TELEPHONE LAB INC

Inventor： SKELLETT ALBERT M

IPC: H01J43/02 ,  H03F1/36 ,  H03K3/04

CPC classification number: H03F1/36 ,  H01J43/02 ,  H03K3/04

公开(公告)号：US2272232A

公开(公告)日：1942-02-10

申请号：US34871140

申请日：1940-07-31

Applicant: RCA CORP

Inventor： WAGNER HERBERT M

IPC: H01J43/02

CPC classification number: H01J43/02

公开(公告)号：US2270405A

公开(公告)日：1942-01-20

申请号：US28893539

申请日：1939-08-08

Applicant: INT STANDARD ELECTRIC CORP

Inventor： HARRISON BLACK DONALD

IPC: H01J43/02 ,  H03K4/12 ,  H03K4/18

CPC classification number: H01J43/025 ,  H03K4/12 ,  H03K4/18

公开(公告)号：US2235190A

公开(公告)日：1941-03-18

申请号：US19478838

申请日：1938-03-09

Applicant: RCA CORP

Inventor： PETRUS ALMA GERRIT HENDRIK ,  HENDRIK JONKER JOHAN LODEWIJK

IPC: G05F1/52 ,  H01J43/02

CPC classification number: G05F1/52 ,  H01J43/025

公开(公告)号：US2212645A

公开(公告)日：1940-08-27

申请号：US14541337

申请日：1937-05-29

Applicant: RCA CORP

Inventor： MORTON GEORGE A

IPC: H01J43/02

CPC classification number: H01J43/02

公开(公告)号：US2191903A

公开(公告)日：1940-02-27

申请号：US22407138

申请日：1938-08-10

Applicant: MO VALVE COMPANY LTD

Inventor： HERBERT ALDOUS WILLIAM

IPC: H01J43/02 ,  H03D7/10

CPC classification number: H03D7/10 ,  H01J43/02

公开(公告)号：US2168165A

公开(公告)日：1939-08-01

申请号：US19833938

申请日：1938-03-26

Applicant: GEN ELECTRIC

Inventor： KOLLER LEWIS R ,  JOHNSON RALPH P

IPC: H01J43/02

CPC classification number: H01J43/025 ,  Y10T307/773

公开(公告)号：US2031331A

公开(公告)日：1936-02-18

申请号：US1076835

申请日：1935-03-13

Applicant: RCA CORP

Inventor： MICHEL PENNING FRANS

IPC: H01J40/16 ,  H01J43/02

CPC classification number: H01J43/02 ,  H01J40/16

公开(公告)号：US1748386A

公开(公告)日：1930-02-25

申请号：US14618626

申请日：1926-11-04

Applicant: RCA CORP

Inventor： SIEGMUND LOEWE

IPC: H01J1/30 ,  H01J43/02

CPC classification number: H01J43/02 ,  H01J1/30

公开(公告)号：US20230386810A1

公开(公告)日：2023-11-30

申请号：US17752151

申请日：2022-05-24

Applicant: Elbit Systems of America, LLC

Inventor： Stephen Carroll ,  William J. Baney ,  Cooper Gray Temple ,  Matthew Robert Curtis

IPC: H01J43/28 ,  G02B23/12 ,  H01J43/02 ,  H01J43/12 ,  C23C14/04 ,  C23C14/14 ,  C23C14/24 ,  C23C14/50 ,  C03C15/00

CPC classification number: H01J43/28 ,  G02B23/125 ,  H01J43/02 ,  H01J43/12 ,  C23C14/042 ,  C23C14/14 ,  C23C14/24 ,  C23C14/505 ,  C03C15/00

Abstract: A night vision system, a microchannel plate (MCP), and a planetary deposition system and methodology are provided for selectively depositing an electrode contact metal on one side of MCP channel openings. One or more MCPs can be releasably secured to a face of a platter that rotates about its central platter axis. The rotating platter can be tilted on a rotating ring fixture surrounding an evaporative source of contact metal. Therefore, the rotating platter further rotates so that it orbits around the evaporative source of contact metal. A mask with a variable size mask opening is arranged between the rotating platter and the evaporative source. While the mask orbits around the evaporative source with the rotating platter, the mask does not rotate along its own axis as does the rotating platter.