Display Substrate Panel and Preparation Method Thereof, and Display Panel

    公开(公告)号:US20210328183A1

    公开(公告)日:2021-10-21

    申请号:US16764885

    申请日:2019-12-23

    Abstract: A display substrate panel includes a substrate and multiple OLED elements disposed on the substrate, and further includes a thin film encapsulation layer disposed on the OLED elements and a light blocking layer disposed on the thin film encapsulation layer and located between two adjacent OLED elements. A display panel includes the above display substrate panel and a cover panel which is aligned and combined into a cell with the display substrate panel, wherein the cover panel includes a color film layer, and the color film layer has a red color film, a green color film and a blue color film which are disposed to correspond to the OLED elements.

    ARRAY SUBSTRATE, ELECTROLUMINESCENT PANEL AND DISPLAY DEVICE

    公开(公告)号:US20210233973A1

    公开(公告)日:2021-07-29

    申请号:US16768174

    申请日:2019-12-17

    Abstract: The present disclosure provides an array substrate, an electroluminescent panel and a display device, to solve the problems of more manufacturing processes and complex structures of the large-sized OLED display panel in the related art. The array substrate includes: a substrate, a plurality of light sensors on the substrate, a flat layer on the light sensor, and a connected electrode layer on the flat layer, wherein each of the light sensors includes a first electrode, a photosensitive layer and a second electrode arranged in sequence on the substrate; wherein the connected electrode layer is connected with the second electrode through a via hole penetrating through the flat layer.

    MANUFACTURING METHOD OF OLED MICROCAVITY STRUCTURE

    公开(公告)号:US20210226180A1

    公开(公告)日:2021-07-22

    申请号:US16955195

    申请日:2019-12-19

    Abstract: A manufacturing method of OLED microcavity structure is provided. The manufacturing method includes: forming a reflective anode on a substrate; forming a transparent conductive film layer having a thickness corresponding to a required pixel on the reflective anode; patterning the transparent conductive film layer and the reflective anode with a pixel mask corresponding to the required pixel to form a pattern of the required pixel; and repeating the above steps on a resultant structure surface according to display requirements until a pixel display structure required by a display device is obtained.

    ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY DEVICE

    公开(公告)号:US20190280018A1

    公开(公告)日:2019-09-12

    申请号:US16061078

    申请日:2017-10-26

    Abstract: An array substrate, a manufacturing method thereof and a display device are provided. The manufacturing method includes: forming a light-shielding pattern layer, a buffer layer, an active layer, a gate insulating layer and a gate electrode on a base substrate, which are away from the base substrate in sequence; depositing an amorphous silicon (a-Si) film on the base substrate in a temperature range of 15-150° C.; forming a first interlayer dielectric (ILD) at least disposed above the active layer by patterning the a-Si film; forming through holes in the first ILD, through which a source contact region and a drain contact region of the active layer are exposed; and forming a source electrode and a drain electrode on the first ILD, which are respectively connected with the source contact region and the drain contact region via the through holes.

    COLOR FILM SUBSTRATE, TOUCH DISPLAY AND METHOD FOR MANUFACTURING THE COLOR FILM SUBSTRATE
    35.
    发明申请
    COLOR FILM SUBSTRATE, TOUCH DISPLAY AND METHOD FOR MANUFACTURING THE COLOR FILM SUBSTRATE 有权
    彩色薄膜基板,触控显示器和制造彩色薄膜基板的方法

    公开(公告)号:US20170040460A1

    公开(公告)日:2017-02-09

    申请号:US14908877

    申请日:2015-08-20

    Abstract: The present invention discloses an array substrate and a preparation method thereof, a display panel and a display device, so as to solve the problem that the performance of the oxide TFT may be reduced and even out of work due to relatively great shift of the threshold voltage of the oxide TFT since the water, oxygen and hydrogen groups may permeate to the active layer of the oxide TFT from the passivation layer above the oxide TFT. The array substrate comprises a base substrate, an oxide thin film transistor TFT formed on the base substrate, a passivation layer being arranged above the oxide TFT, the passivation layer comprises a first film layer, the first film layer being a silicon oxide film; the passivation further comprises a second film layer formed on the first film layer, the second film layer is an alternate stack of silicon nitride films and silicon oxide films, a base layer of the second film layer close to the first film layer is a silicon nitride film; wherein the thickness of the first film layer is greater than the thickness of the second film layer.

    Abstract translation: 本发明公开了阵列基板及其制备方法,显示面板和显示装置,以解决由于阈值相对较大的偏移导致的氧化物薄膜的性能可能降低甚至失去工作的问题 由于水,氧和氢基团可以从氧化物TFT上方的钝化层渗透到氧化物TFT的有源层,因此氧化物TFT的电压。 所述阵列基板包括基底基板,形成在所述基底基板上的氧化物薄膜晶体管TFT,所述钝化层设置在所述氧化物TFT的上方,所述钝化层包括第一膜层,所述第一膜层为氧化硅膜; 所述钝化还包括形成在所述第一膜层上的第二膜层,所述第二膜层是氮化硅膜和氧化硅膜的交替堆叠,所述第二膜层的靠近所述第一膜层的基底层是氮化硅 电影; 其中所述第一膜层的厚度大于所述第二膜层的厚度。

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