专利检索 ap:("John T. Felts" OR "Thomas E. Fisk" OR "Robert S. Abrams" OR "John Ferguson" OR "Jonathan R. Freedman" OR "Robert J. Pangborn" OR "Peter Sagona" OR "Christopher Weikart" OR "Jacob Israelachvili") AND inv:"John T. Felts" 第 4 页

31.

发明授权
Controlled flow vaporizer 失效
标题翻译：控制流量蒸发器

公开(公告)号：US4847469A

公开(公告)日：1989-07-11

申请号：US73676

申请日：1987-07-15

申请人： James J. Hofmann , Robert R. Hoffman , John T. Felts

发明人： James J. Hofmann , Robert R. Hoffman , John T. Felts

IPC分类号： B01D1/00 , C09D183/00 , C23C16/448

CPC分类号： C23C16/4485

摘要： A vaporizing apparatus delivers precisely controlled, substantially continuous and monitored vapor flows for uses such as in plasma enhanced vapor deposition. The vaporizing apparatus includes a fluid passageway along which are a pumping device, a vaporizing device, and a flowing device, all in fluid communication with the passageway. The vaporizing device vaporizes liquid pumped from the pumping device and includes a heat sink layer, a heated layer, and a portion of the passageway sandwiched therebetween. The vaporizing apparatus can sustain a flow of organosilicon vapor at a flow rate of about 1 to about 100 SCCM for as long as desired.