公开(公告)号：US4601806A

公开(公告)日：1986-07-22

申请号：US678239

申请日：1984-12-05

申请人： Peter Wirz

发明人： Peter Wirz

IPC分类号： H01J23/04 ,  H01J37/34 ,  C23C14/34

CPC分类号： H01J37/3426 ,  H01J37/3408

摘要： A magnetron cathode for sputtering targets of ferromagnetic materials. A cathode ground body (2) has at least one supporting surface (4a, 4c) for the target and a magnet system (6) with magnet poles of opposite polarity cohering on the circumference, lying inside one another, and separated by a gap (5a). The target is divided by at least one air gap geometrically similar to the shape of the interval into at least two target parts (12, 13) which are staggered in the direction of the depth of the cathode on the at least one supporting surface (4a, 4c). In accordance with the invention,(a) the magnet system (6) is disposed in back of the farthest set-back supporting surface (4a) for the target (12, 13), and(b) The width "s" of the air gap (14) in the direction of the depth of the cathode is smaller than the dark space interval necessary under operating conditions.

摘要翻译： 用于溅射铁磁材料靶的磁控管阴极。 阴极接地体（2）具有用于靶的至少一个支撑表面（4a，4c）和磁体系统（6），磁体系（6）具有相反极性的磁极，在圆周上相互粘结，彼此相对地间隔开 5a）。 目标被至少一个与间隔的形状几何相似的空气间隙分成至少两个目标部分（12,13），所述至少两个目标部分（12,13）在至少一个支撑表面（4a）上在阴极的深度方向上交错 ，4c）。 根据本发明，（a）磁体系统（6）设置在目标（12,13）的最远的固定支撑表面（4a）的后面，（b） 在阴极深度方向上的气隙（14）小于工作条件下所需的暗空间间隔。