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    Electronic device
    31.
    外观设计
    Electronic device 有权

    公开(公告)号：USD986202S1

    公开(公告)日：2023-05-16

    申请号：US29812267

    申请日：2021-10-20

    Applicant: Samsung Electronics Co., Ltd.

    Designer： Jinhoo Lee ,  Junwon Lee ,  Namsu Kim ,  Kangmoon Kim ,  Dahyun Lee ,  Jieun Myung ,  Junho Jin ,  Jiyun Lim ,  Bosoon Kang

    Abstract: FIG. 1 is a front perspective view of an electronic device showing our new design according to a first embodiment;
    FIG. 2 is a front view thereof;
    FIG. 3 is a rear view thereof;
    FIG. 4 is a left side view thereof;
    FIG. 5 is a right side view thereof;
    FIG. 6 is a top plan view thereof;
    FIG. 7 is a bottom plan view thereof;
    FIG. 8 is a rear perspective view thereof;
    FIG. 9 is a front perspective view of an electronic device showing our new design according to a second embodiment;
    FIG. 10 is a front view thereof;
    FIG. 11 is a rear view thereof;
    FIG. 12 is a left side view thereof;
    FIG. 13 is a right side view thereof;
    FIG. 14 is a top plan view thereof;
    FIG. 15 is a bottom plan view thereof; and,
    FIG. 16 is a rear perspective view thereof.
    The dashed broken lines in the figures depict portions of the electronic device that form no part of the claimed design.
    The dot-dash broken lines in the drawings define the boundaries of the claimed design and form no part thereof.

    CONTAMINANT ANALYSIS APPARATUS AND WATER QUALITY MONITORING SYSTEM
    34.
    发明申请
    CONTAMINANT ANALYSIS APPARATUS AND WATER QUALITY MONITORING SYSTEM 有权

    公开(公告)号：US20220365058A1

    公开(公告)日：2022-11-17

    申请号：US17659695

    申请日：2022-04-19

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Jiyun Lim ,  Eunju Park ,  Yeontae Kim ,  Jinho Kim

    IPC: G01N33/18 ,  C02F1/52 ,  C02F1/54 ,  H04W4/38

    Abstract: A real-time wastewater treatment and water quality monitoring system includes a plurality of wastewater treatment facilities configured to purify wastewater generated from semiconductor manufacturing lines, a plurality of contaminant analysis apparatuses configured to obtain and analyze a sample from effluent water discharged through discharge pipes of the wastewater treatment facilities respectively, discharge rate sensors installed in the discharge pipes respectively, and an integrated monitoring apparatus configured to receive measurement result values from the contaminant analysis apparatuses and the discharge rate sensors and monitor in real time concentration of a contaminant in an entirety of the effluent water that is purified and discharged from the wastewater generated in the semiconductor manufacturing lines.

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