公开(公告)号：US20080111572A1

公开(公告)日：2008-05-15

申请号：US12009128

申请日：2008-01-15

Applicant: January Kister

Inventor： January Kister

IPC: G01R31/02

CPC classification number: G01R1/07357 ,  G01R1/07371

Abstract: Method and apparatus using a retention arrangement with a potting enclosure for holding a plurality of probes by their retention portions, the probes being of the type having contacting tips for establishing electrical contact with pads or bumps of a device under test (DUT) to perform an electrical test. The retention arrangement has a top plate with top openings for the probes, a bottom plate with bottom openings for the probes, the plates being preferably made of ceramic with laser-machined openings, and a potting enclosure between the plates for admitting a potting agent that upon curing pots the retaining portions of the probes. In some embodiments a spacer is positioned between the top and bottom plates for defining the potting enclosure. Alternatively, the retention arrangement has intermediate plates located in the potting enclosure and having probe guiding openings to guide the probes.

公开(公告)号：US20080068035A1

公开(公告)日：2008-03-20

申请号：US11521944

申请日：2006-09-14

Applicant: January Kister

Inventor： January Kister

IPC: G01R31/02

CPC classification number: G01R1/06733 ,  G01R1/07357

Abstract: An improved knee probe for probing electrical devices and circuits is provided. The improved knee probe has a reduced thickness section to alter the mechanical behavior of the probe when contact is made. The reduced thickness section of the probe makes it easier to deflect the probe vertically when contact is made. This increased ease of vertical deflection tends to reduce the horizontal contact force component responsible for the scrub motion, thereby decreasing scrub length. Here “thickness” is the probe thickness in the deflection plane of the probe (i.e., the plane in which the probe knee lies). The reduced thickness probe section provides increased design flexibility for controlling scrub motion, especially in combination with other probe parameters affecting the scrub motion.

Abstract translation: 提供了一种用于探测电气设备和电路的改进的膝部探针。 改进的膝关节探针具有减小的厚度部分，以在接触时改变探针的机械性能。 探头的厚度减小部分使接触时更容易使探针垂直偏转。 这种增加的垂直偏转的容易性倾向于减少负责擦洗运动的水平接触力分量，从而减少擦洗长度。 这里，“厚度”是探针的偏转平面中的探针厚度（即探针膝盖所在的平面）。 减小厚度的探针部分提供增加的设计灵活性，用于控制擦洗运动，特别是与影响擦洗运动的其他探头参数组合。