公开(公告)号：US07898081B2

公开(公告)日：2011-03-01

申请号：US12168057

申请日：2008-07-03

Applicant: Bang-Chiang Lan ,  Li-Hsun Ho ,  Wei-Cheng Wu ,  Hui-Min Wu ,  Min Chen ,  Chien-Hsin Huang ,  Ming-I Wang

Inventor： Bang-Chiang Lan ,  Li-Hsun Ho ,  Wei-Cheng Wu ,  Hui-Min Wu ,  Min Chen ,  Chien-Hsin Huang ,  Ming-I Wang

IPC: H01L23/00 ,  H02K41/00

CPC classification number: H04R31/00 ,  H04R2201/003 ,  Y10T29/49005

Abstract: A MEMS device includes a vent hole structure and a MEMS structure disposed on a same side of a substrate. The vent hole structure adjoins the MEMS structure with an etch stop structure therebetween. The MEMS structure includes a chamber, the vent hole structure includes a metal layer having at least a hole thereon as a vent hole to connect the chamber of the MEMS structure through the etch stop structure. Accordingly, the MEMS device has a lateral vent hole. Furthermore, as the vent hole structure and the MEMS structure are disposed on the same side of the substrate, the manufacturing process is convenient and timesaving.

Abstract translation: MEMS器件包括设置在基板的同一侧上的通气孔结构和MEMS结构。 通气孔结构与MEMS结构相邻，其间具有蚀刻停止结构。 MEMS结构包括腔室，通气孔结构包括金属层，其上具有至少一个孔，作为通气孔，以通过蚀刻停止结构连接MEMS结构的室。 因此，MEMS器件具有侧向通气孔。 此外，由于通气孔结构和MEMS结构设置在基板的同一侧，所以制造过程方便且节省时间。