公开(公告)号：US07671990B1

公开(公告)日：2010-03-02

申请号：US11759183

申请日：2007-06-06

申请人： Michael E. Adel ,  Vladimir Levinski ,  Elyakim Kassel

发明人： Michael E. Adel ,  Vladimir Levinski ,  Elyakim Kassel

IPC分类号： G01B11/00

CPC分类号： G03F7/70633 ,  G03F7/70683

摘要： The present invention is directed to novel metrology marks and methods for their use. The marks comprise cross hashed overlay metrology marks formed on a substrate including a plurality of target regions. The mark including a first grating structure formed in one layer of a target region and including a second grating structure formed in another layer of the target region. The periodic features of the first and second grating structures are oriented substantially orthogonal one another to form a cross-hatched metrology target in the target region. Additionally, the patent discloses methods of employing the metrology marks to obtain overlay metrology measurements.

摘要翻译： 本发明涉及新颖的计量标记及其使用方法。 标记包括形成在包括多个目标区域的基板上的交叉散列叠加计量标记。 该标记包括形成在目标区域的一个层中并包括形成在目标区域的另一层中的第二光栅结构的第一光栅结构。 第一和第二光栅结构的周期特征被定向为基本上彼此正交，以在目标区域中形成交叉阴影的计量目标。 此外，该专利公开了使用计量标记来获得覆盖度量测量的方法。