THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME
    41.
    发明申请
    THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME 有权
    薄膜沉积装置及使用其制造有机发光显示装置的方法

    公开(公告)号:US20110033964A1

    公开(公告)日:2011-02-10

    申请号:US12849193

    申请日:2010-08-03

    IPC分类号: H01L21/20

    摘要: A thin film deposition apparatus and a method of manufacturing an organic light-emitting display device using the thin film deposition apparatus. The thin film deposition apparatus includes a plurality of thin film deposition assemblies, each of which includes: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits arranged in a first direction; and a barrier plate assembly that is disposed between the deposition source nozzle unit and the patterning slit sheet, in the first direction. The barrier plate assembly includes a plurality of barrier plates that partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces.

    摘要翻译: 一种薄膜沉积设备和使用该薄膜沉积设备制造有机发光显示设备的方法。 薄膜沉积设备包括多个薄膜沉积组件,每个薄膜沉积组件包括:沉积源,其沉积沉积材料; 沉积源喷嘴单元,其设置在所述沉积源的一侧并且包括多个沉积源喷嘴; 图案化缝隙片,其与所述沉积源喷嘴单元相对地设置并且包括沿第一方向布置的多个图案化狭缝; 以及在第一方向上设置在沉积源喷嘴单元和图案化缝隙片之间的阻挡板组件。 阻挡板组件包括将沉积源喷嘴单元和图案化缝隙片之间的空间分隔成多个次沉积空间的多个阻挡板。

    Mask assembly for cathode ray tube (CRT)
    42.
    发明授权
    Mask assembly for cathode ray tube (CRT) 失效
    阴极射线管(CRT)

    公开(公告)号:US07486008B2

    公开(公告)日:2009-02-03

    申请号:US11377358

    申请日:2006-03-17

    IPC分类号: H01J29/80

    摘要: A mask assembly for a Cathode Ray Tube (CRT) includes a shadow mask with a plurality of beam passage holes, and a frame including a supporting portion with a pair of long sides and a pair of short sides which fix the shadow mask and a strength maintenance portion bent from the supporting portion. The frame includes a plurality of reinforcement indentations formed on a portion of the boundary between the supporting portion and the strength maintenance portion. At least one of the reinforcement indentations satisfies the following condition: S 1 3 ≤ S 2 ≤ 2 3 ⁢ S 1 wherein S1 represents an area of a triangle defined by a width of the supporting portion including the reinforcement indentation, a width of the strength maintenance portion including the reinforcement indentation and an imaginary line connecting an end of the supporting portion and an end of the strength maintenance portion, and wherein S2 represents a sectional area of the reinforcement indentation.

    摘要翻译: 用于阴极射线管(CRT)的掩模组件包括具有多个光束通过孔的荫罩和包括具有一对长边的支撑部分和一对固定荫罩的一对短边的框架, 保养部从支撑部弯曲。 框架包括形成在支撑部分和强度维持部分之间的边界部分上的多个加强件凹口。 至少有一个加固缺口满足以下条件: < 1 3 <= S 2 <= 2 3 / mo> S 1 其中S1表示三角形 由包括加强件压痕的支撑部分的宽度,包括加强件凹陷的强度维持部分的宽度和连接支撑部分的端部和强度维持部分的端部的假想线限定,并且其中S2表示截面 钢筋压痕面积。

      Tension mask with inner shield structure for cathode ray tube
      43.
      发明授权
      Tension mask with inner shield structure for cathode ray tube 失效
      用于阴极射线管的内屏蔽结构的张力罩

      公开(公告)号:US06825598B2

      公开(公告)日:2004-11-30

      申请号:US10342073

      申请日:2003-01-13

      IPC分类号: H01J2980

      CPC分类号: H01J29/07 H01J29/003

      摘要: A tension mask cathode ray tube has a vacuum tube and an inner shield mounted within the vacuum tube to shield the vacuum tube from geomagnetism. A value Br/Hc of the inner shield where Br indicates a residual magnetic flux density and Hc indicates a coercive force is established to be 1.0-2.0 times more than a value Br/Hc of the mask frame. In this structure, the route of electron beams is established to be more precise. Consequently, the purity characteristic and the convergence characteristic are improved while forming a precise raster. In this way, the display screen quality can be enhanced.

      摘要翻译: 张力屏蔽阴极射线管具有真空管和安装在真空管内的内屏蔽件,用于屏蔽真空管免受地磁影响。 其中Br表示残留磁通密度,Hc表示矫顽力的内屏蔽的值Br / Hc被确定为掩模框架的值Br / Hc的1.0-2.0倍。 在这种结构中,电子束的路线被确定为更精确。 因此,在形成精确光栅的同时,提高了纯度特性和收敛特性。 以这种方式,可以提高显示屏的质量。