公开(公告)号：US20180174799A1

公开(公告)日：2018-06-21

申请号：US15736278

申请日：2017-05-25

Applicant: Boe Technology Group Co., Ltd. ,  Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Inventor： Yu WEI ,  Jun LIU

IPC: H01J37/32

CPC classification number: H01J37/321 ,  H01J37/32119 ,  H01J37/32651 ,  H01J2237/3344

Abstract: The present disclosure provides an inductively coupled plasma device, comprising a reaction chamber, a dielectric coupling plate, and a coil above the dielectric coupling plate. The dielectric coupling plate comprises at least two layers. The dielectric coupling plate comprises a plurality of regions, each region being provided with an electric field regulating structure, the electric field regulating structure being located between the at least two layers of the dielectric coupling plate. The electric field regulating structure is configured to regulate an intensity of an electric field that enters the reaction chamber through each region of the dielectric coupling plate.