公开(公告)号：US3932597A

公开(公告)日：1976-01-13

申请号：US587746

申请日：1975-06-17

申请人： Ricardo C. Pastor

发明人： Ricardo C. Pastor

IPC分类号： C01D3/20 ,  C01D3/04 ,  C01D3/10 ,  C01D3/12

CPC分类号： C01D3/20

摘要： A new process or method has been developed whereby the purity of metal halides, prepared by conventional methods, can be significantly upgraded. The process, which includes a scrubbing of metal halides with a halide-source species in the vapor phase, has been shown to be effective not only in reducing the concentration of oxyanion impurities and volatile cation halide impurities, but effective in reducing hydroxyl ion (OH.sup.-) contaminations as well.Metal halides purified by this method are particularly useful as starting materials for growing optically pure metal halide crystals.

摘要翻译： 已经开发了一种新方法或方法，由此通过常规方法制备的金属卤化物的纯度可以显着提高。 已经显示包括在气相中用卤化物源物质洗涤金属卤化物的方法不仅有效地降低氧阴离子杂质和挥发性阳离子卤化物杂质的浓度，而且有效地还原羟基离子（OH < - >）污染。