公开(公告)号：US20140147976A1

公开(公告)日：2014-05-29

申请号：US13835314

申请日：2013-03-15

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seung-Bo SHIM ,  Jun-Gi Kim ,  Yong-Jun Park ,  Yang-Ho Jung ,  Jin-Ho Ju

IPC: G03F1/38 ,  H01L29/66

CPC classification number: H01L27/1288 ,  G03F1/22 ,  G03F1/38 ,  H01L27/124

Abstract: An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

Abstract translation: 曝光掩模包括第一传输部分，第二传输部分和阻挡部分。 第一传输部分被配置为当用光照射时以第一能级传输光。 第一传输部分与在下层中形成第一接触孔相关联地设置。 第二传输部分被配置为当用光照射时以第二能级传输光。 第二传输部分与在下层中形成第二接触孔相关联地设置。 阻挡部分被配置为阻挡光，并且与底层的第一区域和第二区域之间的边界区域相关联地设置。 第二传输部分还被配置为使得第二接触孔比第一接触孔更深地形成在下层中。