公开(公告)号：US20070092129A1

公开(公告)日：2007-04-26

申请号：US11520800

申请日：2006-09-14

申请人： Akiyuki Sugiyama ,  Hiroyuki Shindo

发明人： Akiyuki Sugiyama ,  Hiroyuki Shindo

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06K9/6203 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/2817

摘要： A scanning electron microscope comprises an image processing system for carrying out a pattern matching between a first image and a second image. The image processing system comprises: a paint-divided image generator for generating a paint divided image based on the first image; a gravity point distribution image generator for carrying out a smoothing process of the paint divided image and generating a gravity point distribution image; an edge line segment group generation unit for generating a group of edge line segments based on the second image; a matching score calculation unit for calculating a matching score based on the gravity point distribution image and the group of edge line segments; and a maximum score position detection unit for detecting a position where the matching score becomes the maximum.

摘要翻译： 扫描电子显微镜包括用于执行第一图像和第二图像之间的图案匹配的图像处理系统。 图像处理系统包括：油漆分割图像生成器，用于基于第一图像生成油漆分割图像; 重力点分布图像发生器，用于执行油漆分割图像的平滑处理并产生重力点分布图像; 边缘线段组生成单元，用于基于第二图像生成一组边缘线段; 匹配分数计算单元，用于基于重力点分布图像和边缘线段组来计算匹配分数; 以及最大得分位置检测单元，用于检测匹配得分变为最大值的位置。

公开(公告)号：US20140219545A1

公开(公告)日：2014-08-07

申请号：US14234977

申请日：2012-07-20

申请人： Akiyuki Sugiyama ,  Yuichi Abe

发明人： Akiyuki Sugiyama ,  Yuichi Abe

IPC分类号： G06T7/00

CPC分类号： G06T7/001 ,  G01B15/08 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： When the lengths of FEM wafers are automatically measured, not only the sizes of targets, the lengths of which are to be measured, are often varied from those in registration, but also the patterns of the targets are often deformed. Therefore, it is difficult to automatically determine whether the length measurement is possible or not. Therefore, the following are executed with a semiconductor inspection system: (1) a process of identifying the position of the contour line of an inspected image using a distance image calculated from a reference image, (2) a process of calculating a defect size image based on the position of the contour line with respect to the identified distance image, and detecting a defect candidate from the defect size image, and (3-1) a process of, upon detection of the defect candidate, calculating the size of the detected defect candidate, or (3-2) a process of detecting a portion different between the first and second contour lines as the defect candidate.

摘要翻译： 当自动测量有限元晶片的长度时，不仅要测量其长度的目标的尺寸通常与注册的尺寸不同，而且目标的图案也经常变形。 因此，难以自动确定长度测量是否可行。 因此，使用半导体检查系统执行以下操作：（1）使用从参考图像计算的距离图像来识别被检查图像的轮廓线的位置的处理，（2）计算缺陷尺寸图像的处理 基于所述轮廓线相对于所识别的距离图像的位置，以及从所述缺陷尺寸图像检测缺陷候选，以及（3-1）在检测到所述缺陷候选时，计算所检测到的所述缺陷候选的大小的处理 缺陷候选者，或（3-2）检测第一和第二轮廓线之间的部分的缺陷候选的处理。

公开(公告)号：US08285056B2

公开(公告)日：2012-10-09

申请号：US12401848

申请日：2009-03-11

申请人： Junichi Taguchi ,  Mitsuji Ikeda ,  Osamu Komuro ,  Akiyuki Sugiyama

发明人： Junichi Taguchi ,  Mitsuji Ikeda ,  Osamu Komuro ,  Akiyuki Sugiyama

IPC分类号： G06K9/46

CPC分类号： G06T7/001 ,  G06K9/6206 ,  G06T2207/10061 ,  G06T2207/30148

摘要： A matching degree computing apparatus is provided for comparing an input image and an object template image and computing a matching degree between an input image and an object template image based on the compared result. The computing apparatus includes a transforming unit for transforming the input image so as to be matched to the template object region and a computing unit for computing a matching degree between the transformed input image and the template image. The transforming unit provides a shaping unit for shaping a non-background region to the form of the template object region in the object corresponding region of the input image and a processing unit for arranging the non-background region contacting with the template object corresponding region so that the non-background region has no substantial impact on the matching degree in the object non-corresponding region of the input image.

摘要翻译： 提供了一种匹配度计算装置，用于比较输入图像和对象模板图像，并且基于比较结果计算输入图像和对象模板图像之间的匹配度。 计算装置包括：变换单元，用于变换输入图像以与模板对象区域匹配;以及计算单元，用于计算变换后的输入图像与模板图像之间的匹配度。 变换单元提供一个成形单元，用于将非背景区域形成为输入图像的对象对应区域中的模板对象区域的形式;以及处理单元，用于布置与模板对象对应区域接触的非背景区域 非背景区域对输入图像的对象非对应区域中的匹配度没有实质影响。

公开(公告)号：US20090232405A1

公开(公告)日：2009-09-17

申请号：US12401848

申请日：2009-03-11

申请人： Junichi Taguchi ,  Mitsuji Ikeda ,  Osamu Komuro ,  Akiyuki Sugiyama

发明人： Junichi Taguchi ,  Mitsuji Ikeda ,  Osamu Komuro ,  Akiyuki Sugiyama

IPC分类号： G06K9/68

CPC分类号： G06T7/001 ,  G06K9/6206 ,  G06T2207/10061 ,  G06T2207/30148

摘要： A matching degree computing apparatus is provided for comparing an input image and an object template image and computing a matching degree between an input image and an object template image based on the compared result. The computing apparatus includes a transforming unit for transforming the input image so as to be matched to the template object region and a computing unit for computing a matching degree between the transformed input image and the template image. The transforming unit provides a shaping unit for shaping a non-background region to the form of the template object region in the object corresponding region of the input image and a processing unit for arranging the non-background region contacting with the template object corresponding region so that the non-background region has no substantial impact on the matching degree in the object non-corresponding region of the input image.

摘要翻译： 提供了一种匹配度计算装置，用于比较输入图像和对象模板图像，并且基于比较结果计算输入图像和对象模板图像之间的匹配度。 计算装置包括：变换单元，用于变换输入图像以与模板对象区域匹配;以及计算单元，用于计算变换后的输入图像与模板图像之间的匹配度。 变换单元提供一个成形单元，用于将非背景区域形成为输入图像的对象对应区域中的模板对象区域的形式;以及处理单元，用于布置与模板对象对应区域接触的非背景区域 非背景区域对输入图像的对象非对应区域中的匹配度没有实质影响。

公开(公告)号：US09704235B2

公开(公告)日：2017-07-11

申请号：US14234977

申请日：2012-07-20

申请人： Akiyuki Sugiyama ,  Yuichi Abe

发明人： Akiyuki Sugiyama ,  Yuichi Abe

IPC分类号： G06T7/00 ,  G01B15/08 ,  H01L21/66

CPC分类号： G06T7/001 ,  G01B15/08 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： When the lengths of FEM wafers are automatically measured, not only the sizes of targets, the lengths of which are to be measured, are often varied from those in registration, but also the patterns of the targets are often deformed. Therefore, it is difficult to automatically determine whether the length measurement is possible or not. Therefore, the following are executed with a semiconductor inspection system: (1) a process of identifying the position of the contour line of an inspected image using a distance image calculated from a reference image, (2) a process of calculating a defect size image based on the position of the contour line with respect to the identified distance image, and detecting a defect candidate from the defect size image, and (3-1) a process of, upon detection of the defect candidate, calculating the size of the detected defect candidate, or (3-2) a process of detecting a portion different between the first and second contour lines as the defect candidate.

公开(公告)号：US20050232493A1

公开(公告)日：2005-10-20

申请号：US11104632

申请日：2005-04-13

申请人： Norio Satou ,  Akiyuki Sugiyama ,  Osamu Komuro ,  Satoru Yamaguchi

发明人： Norio Satou ,  Akiyuki Sugiyama ,  Osamu Komuro ,  Satoru Yamaguchi

IPC分类号： H01L21/66 ,  G06K9/62 ,  G06T1/00 ,  G06T7/00

CPC分类号： G06T7/001

摘要： According to the pattern search method of the present invention, detection of a detection image region relative to an observation image is performed by a pattern matching. An image whose size is substantially the same as that of the observation image is used as the detection image region. The detection image region is relatively displaced with reference to the observation image, thereby detecting a degree of similarity for a common region which is common to both of the region and the image. Displacement range of the detection image region is set in advance. If area of the common region is larger than a predetermined value, calculating the degree of similarity will be performed.

摘要翻译： 根据本发明的图案搜索方法，通过图案匹配来执行相对于观察图像的检测图像区域的检测。 使用与观察图像基本相同的图像作为检测图像区域。 检测图像区域相对于观察图像相对移位，从而检测对于区域和图像两者共同的公共区域的相似度。 预先设定检测图像区域的位移范围。 如果公共区域的面积大于预定值，则将执行相似度的计算。

公开(公告)号：US07941008B2

公开(公告)日：2011-05-10

申请号：US11104632

申请日：2005-04-13

申请人： Norio Satou ,  Akiyuki Sugiyama ,  Osamu Komuro ,  Satoru Yamaguchi

发明人： Norio Satou ,  Akiyuki Sugiyama ,  Osamu Komuro ,  Satoru Yamaguchi

IPC分类号： G06K9/54

CPC分类号： G06T7/001

摘要： According to the pattern search method of the present invention, detection of a detection image region relative to an observation image is performed by a pattern matching. An image whose size is substantially the same as that of the observation image is used as the detection image region. The detection image region is relatively displaced with reference to the observation image, thereby detecting a degree of similarity for a common region which is common to both of the region and the image. Displacement range of the detection image region is set in advance. If area of the common region is larger than a predetermined value, calculating the degree of similarity will be performed.

摘要翻译： 根据本发明的图案搜索方法，通过图案匹配来执行相对于观察图像的检测图像区域的检测。 使用与观察图像基本相同的图像作为检测图像区域。 检测图像区域相对于观察图像相对移位，从而检测对于区域和图像两者共同的公共区域的相似度。 预先设定检测图像区域的位移范围。 如果公共区域的面积大于预定值，则将执行相似度的计算。