Defect inspection device and defect inspection method
    1.
    发明申请
    Defect inspection device and defect inspection method 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US20080310702A1

    公开(公告)日:2008-12-18

    申请号:US12068005

    申请日:2008-01-31

    IPC分类号: G06K9/00

    CPC分类号: G06T7/001

    摘要: In an apparatus for photographing an image of a product to judge whether or not a defect is present, a manufacturing desirable image is formed from data acquired when the product was designed, which could be obtained if no defect was present when the product was photographed, an inspection portion where a defect may occur is selected from the formed manufacturing desirable image, a defect pattern is superimposed on the selected inspection portion so as to form a template equipped with the defect pattern. The image of the product is photographed, a template matching operation is carried out as a template having the defect pattern, and judgement is made whether or not a defect is present based upon a matched evaluation value. As a result, the judgement for judging whether or not the defect is present can be directly carried out based upon the evaluation value.

    摘要翻译: 在用于拍摄产品的图像以判断是否存在缺陷的装置中,当产品被设计时获得的数据形成制造期望的图像,如果在拍摄产品时没有存在缺陷,则可以获得, 从形成的制造期望图像中选择可能发生缺陷的检查部分,将缺陷图案叠加在所选择的检查部分上,以形成配备有缺陷图案的模板。 拍摄产品的图像,进行模板匹配操作作为具有缺陷图案的模板,并且基于匹配的评估值判断是否存在缺陷。 结果,可以基于评估值直接进行用于判断是否存在缺陷的判断。

    Flow velocity calculating method in magnetic resonance imaging apparatus
    3.
    发明授权
    Flow velocity calculating method in magnetic resonance imaging apparatus 失效
    磁共振成像装置中的流速计算方法

    公开(公告)号:US5929637A

    公开(公告)日:1999-07-27

    申请号:US798343

    申请日:1997-02-10

    CPC分类号: G01R33/56308 G01R33/56316

    摘要: The present invention intends to easily perform arithmetic operations for determining flow velocities without making phase correction and to reduce the aliasing error. To this end, a plurality of data pieces having phase sensitivity are measured using phase contrast pulse sequences in a magnetic resonance diagnostic apparatus. When four data pieces having phase sensitivity of tetrahedral type are acquired, four measured images are obtained. Individual measured images have vector values at corresponding points. Predetermined pair images are subjected to an arithmetic operation for determining an angle between two vectors at individual points on the images, the thus obtained phase images are added and a sum image is multiplied by a suitable coefficient to produce an x-direction flow velocity image. Flow velocity images in y and z directions are similarly obtained and images determining the magnitudes of flow velocities can also be produced.

    摘要翻译: 本发明意图容易地执行用于确定流速的算术运算,而不进行相位校正并减少混叠误差。 为此,使用磁共振诊断装置中的相位脉冲序列来测量具有相位敏感度的多个数据。 当获得具有四面体型相位灵敏度的四个数据时,获得四个测量图像。 单个测量图像在对应点具有向量值。 对预定的对图像进行用于确定图像上各个点的两个矢量之间的角度的算术运算,将如此获得的相位图像相加,并且求和图像乘以合适的系数以产生x方向流速图像。 类似地获得y和z方向上的流速图像,也可以产生确定流速大小的图像。

    Apparatus, method and program product for matching with a template
    4.
    发明授权
    Apparatus, method and program product for matching with a template 有权
    用于与模板匹配的装置,方法和程序产品

    公开(公告)号:US08019164B2

    公开(公告)日:2011-09-13

    申请号:US12010763

    申请日:2008-01-29

    IPC分类号: G06K9/68

    CPC分类号: G06K9/6202 G06K9/685

    摘要: A similar image having a high correlation is selected through autocorrelation performs a template original image selected from an image photographed for a template, and a difference image between the similar image and template original image is formed. An image extracting a real difference is formed by removing noises and edges in unstable areas from the difference image. This image is added to the template original image to form a modified template. Template matching is performed by using the modified template as a template. The image extracting the real reference and added to the modified template functions to add an evaluation penalty to the similar image during matching evaluation to lower an evaluation value of the similar image so that a probability of erroneously recognizing the similar image as the image to be detected.

    摘要翻译: 通过自相关选择具有高相关性的类似图像,执行从为模板拍摄的图像中选择的模板原始图像,并且形成相似图像和模板原始图像之间的差分图像。 通过从不同图像中去除不稳定区域中的噪声和边缘,形成提取真实差异的图像。 该图像被添加到模板原始图像以形成修改的模板。 通过使用修改的模板作为模板来执行模板匹配。 提取真实参考并添加到修改的模板的图像功能,以在匹配评估期间向相似图像添加评估代价以降低相似图像的评估值,使得错误地识别与要检测的图像相似的图像的概率 。

    Inspecting method and apparatus for repeated micro-miniature patterns
    5.
    发明授权
    Inspecting method and apparatus for repeated micro-miniature patterns 失效
    用于重复微型图案的检查方法和装置

    公开(公告)号:US06944325B2

    公开(公告)日:2005-09-13

    申请号:US10656221

    申请日:2003-09-08

    IPC分类号: G01N21/956 G06T7/00 G06K9/00

    摘要: An apparatus for inspecting foreign matter in repeated micro-miniature patterns formed upon a surface of an object to be inspected, comprising: an inspection light illuminating device for irradiating an inspection light directed upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; a scattered light detector for detecting scattered light of the inspection light being scattered upon the surface said object to be inspected; means for obtaining a first information related to a foreign matter attaching upon the surface of said object to be inspected, which is obtained on a basis of the detection of said scattered light by said scattered light detector; an illumination means for applying a bright field illumination upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; means for picking up the image of the foreign matter, under a bright field illumination by said illumination means; means for obtaining a second information related to said foreign matter, depending upon an image of said foreign matter, which is obtained on a basis of said picking up of the image by said image picking up means under the bright field illumination; and means for displaying said first information and said second information, both being related to said foreign matter, on a display screen thereof.

    摘要翻译: 一种用于检查形成在待检查物体的表面上的重复微型图案中的异物的装置,包括:检查光照明装置,用于照射指向被检查物体的表面的检查光,其上重复 形成微型图案; 用于检测检查光的散射光的散射光检测器,散射在被检查物体的表面上; 用于根据所述散射光检测器对所述散射光的检测获得的用于获得与附着在所述被检查物体的表面上的异物有关的第一信息的装置; 照明装置,用于在其上形成有重复的微型图案的被检查物体的表面上施加明场照明; 用于在所述照明装置的明场照明下拾取异物的图像的装置; 用于根据所述异物的图像获得与所述异物相关的第二信息的装置,其基于在所述明场照明下的所述图像拾取装置的所述图像拾取而获得; 以及用于在其显示屏幕上显示与所述异物相关的所述第一信息和所述第二信息的装置。

    Inspecting method and apparatus for repeated micro-miniature patterns
    6.
    发明授权
    Inspecting method and apparatus for repeated micro-miniature patterns 失效
    用于重复微型图案的检查方法和装置

    公开(公告)号:US06661912B1

    公开(公告)日:2003-12-09

    申请号:US09127960

    申请日:1998-08-03

    IPC分类号: G06K900

    摘要: An apparatus for inspecting foreign matter in repeated micro-miniature patterns formed upon a surface of an object to be inspected, comprising: an inspection light illuminating device for irradiating an inspection light directed upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; a scattered light detector for detecting scattered light of the inspection light being scattered upon the surface said object to be inspected; means for obtaining a first information related to a foreign matter attaching upon the surface of said object to be inspected, which is obtained on a basis of the detection of said scattered light by said scattered light detector; an illumination means for applying a bright field illumination upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; means for picking up the image of the foreign matter, under a bright field illumination by said illumination means; means for obtaining a second information related to said foreign matter, depending upon an image of said foreign matter, which is obtained on a basis of said picking up of the image by said image picking up means under the bright field illumination; and means for displaying said first information and said second information, both being related to said foreign matter, on a display screen thereof.

    摘要翻译: 一种用于检查形成在待检查物体的表面上的重复微型图案中的异物的装置,包括:检查光照明装置,用于照射指向被检查物体的表面的检查光,其上重复 形成微型图案; 用于检测检查光的散射光的散射光检测器,散射在被检查物体的表面上; 用于根据所述散射光检测器对所述散射光的检测获得的用于获得与附着在所述被检查物体的表面上的异物有关的第一信息的装置; 照明装置,用于在其上形成有重复的微型图案的被检查物体的表面上施加明场照明; 用于在所述照明装置的明场照明下拾取异物的图像的装置; 用于根据所述异物的图像获得与所述异物相关的第二信息的装置,其基于在所述明场照明下的所述图像拾取装置的所述图像拾取而获得; 以及用于在其显示屏幕上显示与所述异物相关的所述第一信息和所述第二信息的装置。

    PATTERN MATCHING APPARATUS AND COMPUTER PROGRAM
    7.
    发明申请
    PATTERN MATCHING APPARATUS AND COMPUTER PROGRAM 审中-公开
    图案匹配装置和计算机程序

    公开(公告)号:US20140023265A1

    公开(公告)日:2014-01-23

    申请号:US13981963

    申请日:2011-12-07

    IPC分类号: G06T7/00

    摘要: It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.The semiconductor inspection apparatus includes means for imaging a shape on a wafer or on an exposure mask; means for storing an image inspected by the imaging means; means for storing design data of the semiconductor circuit corresponding to a position on the wafer or on the exposure mask which are to be imaged by the imaging means; means for storing a design-data image obtained as a result of converting the design data into an image; means for generating a design-data ROI image by converting an interest drawing region found from a relative crude-density relation of a shape included in the design-data image into an image; and a position alignment section configured to carry out position alignment on the inspected image and the design-data image. The semiconductor inspection apparatus makes use of the design-data ROI image in order to identify a position at which the inspected image and the design-data image match each other or compute the degree of coincidence.

    摘要翻译: 本发明的目的是提供一种半导体检查装置,即使被检查的图像是图像,也能够良好地执行位置对准并且正确地确定位置对准是否已经成功地执行或者在没有操作者干预的情况下已经结束 具有与重复图案的情况相同的特性,或被检查图像是具有复杂形状的图像。 半导体检查装置包括用于对晶片或曝光掩模上的形状进行成像的装置; 用于存储由成像装置检查的图像的装置; 用于存储对应于要由成像装置成像的晶片或曝光掩模上的位置的半导体电路的设计数据的装置; 用于存储作为将设计数据转换为图像而获得的设计数据图像的装置; 用于通过将从所述设计数据图像中包含的形状的相对粗密度关系中找到的兴趣绘制区域转换为图像来生成设计数据ROI图像的装置; 以及位置对准部,被配置为在被检查图像和设计数据图像上执行位置对准。 半导体检查装置利用设计数据ROI图像来识别被检查图像和设计数据图像彼此匹配的位置或计算符合度。

    Method and apparatus for computing degree of matching
    8.
    发明授权
    Method and apparatus for computing degree of matching 有权
    计算匹配度的方法和装置

    公开(公告)号:US08285056B2

    公开(公告)日:2012-10-09

    申请号:US12401848

    申请日:2009-03-11

    IPC分类号: G06K9/46

    摘要: A matching degree computing apparatus is provided for comparing an input image and an object template image and computing a matching degree between an input image and an object template image based on the compared result. The computing apparatus includes a transforming unit for transforming the input image so as to be matched to the template object region and a computing unit for computing a matching degree between the transformed input image and the template image. The transforming unit provides a shaping unit for shaping a non-background region to the form of the template object region in the object corresponding region of the input image and a processing unit for arranging the non-background region contacting with the template object corresponding region so that the non-background region has no substantial impact on the matching degree in the object non-corresponding region of the input image.

    摘要翻译: 提供了一种匹配度计算装置,用于比较输入图像和对象模板图像,并且基于比较结果计算输入图像和对象模板图像之间的匹配度。 计算装置包括:变换单元,用于变换输入图像以与模板对象区域匹配;以及计算单元,用于计算变换后的输入图像与模板图像之间的匹配度。 变换单元提供一个成形单元,用于将非背景区域形成为输入图像的对象对应区域中的模板对象区域的形式;以及处理单元,用于布置与模板对象对应区域接触的非背景区域 非背景区域对输入图像的对象非对应区域中的匹配度没有实质影响。

    METHOD AND APPARATUS FOR COMPUTING DEGREE OF MATCHING
    9.
    发明申请
    METHOD AND APPARATUS FOR COMPUTING DEGREE OF MATCHING 有权
    用于计算匹配度的方法和装置

    公开(公告)号:US20090232405A1

    公开(公告)日:2009-09-17

    申请号:US12401848

    申请日:2009-03-11

    IPC分类号: G06K9/68

    摘要: A matching degree computing apparatus is provided for comparing an input image and an object template image and computing a matching degree between an input image and an object template image based on the compared result. The computing apparatus includes a transforming unit for transforming the input image so as to be matched to the template object region and a computing unit for computing a matching degree between the transformed input image and the template image. The transforming unit provides a shaping unit for shaping a non-background region to the form of the template object region in the object corresponding region of the input image and a processing unit for arranging the non-background region contacting with the template object corresponding region so that the non-background region has no substantial impact on the matching degree in the object non-corresponding region of the input image.

    摘要翻译: 提供了一种匹配度计算装置,用于比较输入图像和对象模板图像,并且基于比较结果计算输入图像和对象模板图像之间的匹配度。 计算装置包括:变换单元,用于变换输入图像以与模板对象区域匹配;以及计算单元,用于计算变换后的输入图像与模板图像之间的匹配度。 变换单元提供一个成形单元,用于将非背景区域形成为输入图像的对象对应区域中的模板对象区域的形式;以及处理单元,用于布置与模板对象对应区域接触的非背景区域 非背景区域对输入图像的对象非对应区域中的匹配度没有实质影响。

    Pattern matching apparatus and computer program

    公开(公告)号:US10535129B2

    公开(公告)日:2020-01-14

    申请号:US13981963

    申请日:2011-12-07

    IPC分类号: G06T7/00

    摘要: It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.The semiconductor inspection apparatus includes means for imaging a shape on a wafer or on an exposure mask; means for storing an image inspected by the imaging means; means for storing design data of the semiconductor circuit corresponding to a position on the wafer or on the exposure mask which are to be imaged by the imaging means; means for storing a design-data image obtained as a result of converting the design data into an image; means for generating a design-data ROI image by converting an interest drawing region found from a relative crude-density relation of a shape included in the design-data image into an image; and a position alignment section configured to carry out position alignment on the inspected image and the design-data image. The semiconductor inspection apparatus makes use of the design-data ROI image in order to identify a position at which the inspected image and the design-data image match each other or compute the degree of coincidence.