公开(公告)号：US06819461B2

公开(公告)日：2004-11-16

申请号：US10631829

申请日：2003-08-01

申请人： Hideyo Makino

发明人： Hideyo Makino

IPC分类号： G02B2608

CPC分类号： G02B26/123 ,  H04N1/1135 ,  H04N1/12 ,  H04N1/1911

摘要： A multibeam light source includes a plurality of semiconductor laser arrays, and a deflector. A sub-scanning beam pitch is defined by a distance between an arbitrary point on a line connecting focuses of a preceding array and a point that corresponds to the arbitrary point on a line connecting focuses of an adjoining array. The sub-scanning beam pitch is set as P−(A/VM)·VS+C, where P is a recording density interval on the recoding medium, VM is a main scanning velocity, VS is a sub-scanning velocity, A is an interval between the focuses on the recording medium in a main scanning direction, and C is a correction amount of the beam pitch.

摘要翻译： 多光束光源包括多个半导体激光器阵列和偏转器。 子扫描光束间距由连接先前阵列的焦点的线上的任意点与对应于连接相邻阵列的焦点的线上的任意点的点之间的距离限定。 子扫描光束间距设为P-（A / VM）.VS + C，其中P是记录介质上的记录密度间隔，VM是主扫描速度，VS是副扫描速度，A是 在主扫描方向上的记录介质上的焦点之间的间隔，C是光束间距的校正量。