Plasma processing apparatus
    41.
    发明申请
    Plasma processing apparatus 有权
    等离子体处理装置

    公开(公告)号:US20060137820A1

    公开(公告)日:2006-06-29

    申请号:US11313022

    申请日:2005-12-20

    Abstract: A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.

    Abstract translation: 一种等离子体处理装置,用于在保持真空状态的室中产生等离子体,并使用等离子体处理衬底。 等离子体处理装置包括用于使形成在喷淋头中的制冷剂循环的制冷剂通道,从而容易地控制淋浴头的温度并提高等离子体处理的再现性。

    Apparatus for manufacturing flat-panel display
    42.
    发明申请
    Apparatus for manufacturing flat-panel display 审中-公开
    用于制造平板显示器的装置

    公开(公告)号:US20060071384A1

    公开(公告)日:2006-04-06

    申请号:US11239398

    申请日:2005-09-29

    CPC classification number: B23Q11/0891 H01L21/6719

    Abstract: Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cover to ensure easy opening/closing operations of the upper cover.

    Abstract translation: 这里公开了一种平板显示器(FPD)制造装置,用于在腔室中建立真空气氛之后,对位于腔室中的基板执行期望的处理。 真空室被分为室主体和上盖,以确保上盖容易的打开/关闭操作。

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