公开(公告)号：US20050184292A1

公开(公告)日：2005-08-25

申请号：US11065750

申请日：2005-02-24

申请人： Kun-Ho Kwak ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Won-Seok Cho ,  Hoon Lim ,  Sung-Jin Kim ,  Byung-Jun Hwang ,  Jong-Hyuk Kim

发明人： Kun-Ho Kwak ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Won-Seok Cho ,  Hoon Lim ,  Sung-Jin Kim ,  Byung-Jun Hwang ,  Jong-Hyuk Kim

IPC分类号： H01L21/8244 ,  H01L27/108 ,  H01L27/11

CPC分类号： H01L27/1108 ,  H01L27/11

摘要： Methods of fabricating a semiconductor integrated circuit having thin film transistors using an SEG technique are provided. The methods include forming an inter-layer insulating layer on a single-crystalline semiconductor substrate. A single-crystalline semiconductor plug extends through the inter-layer insulating layer, and a single-crystalline epitaxial semiconductor pattern is in contact with the single-crystalline semiconductor plug on the inter-layer insulating layer. The single-crystalline epitaxial semiconductor pattern is at least partially planarized to form a semiconductor body layer on the inter-layer insulating layer, and the semiconductor body layer is patterned to form a semiconductor body. As a result, the semiconductor body includes at least a portion of the single-crystalline epitaxial semiconductor pattern. Thus, the semiconductor body has an excellent single-crystalline structure. Semiconductor integrated circuits fabricated using the methods are also provided.

摘要翻译： 提供了使用SEG技术制造具有薄膜晶体管的半导体集成电路的方法。 所述方法包括在单晶半导体衬底上形成层间绝缘层。 单晶半导体插件延伸穿过层间绝缘层，并且单晶外延半导体图案与层间绝缘层上的单晶半导体插头接触。 单晶外延半导体图案至少部分地平坦化以在层间绝缘层上形成半导体本体层，并且对半导体本体层进行图案化以形成半导体本体。 结果，半导体本体包括单晶外延半导体图案的至少一部分。 因此，半导体本体具有优异的单晶结构。 还提供了使用这些方法制造的半导体集成电路。