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51.发明授权公开(公告)号：US11579353B2
公开(公告)日：2023-02-14
申请号：US17089546
申请日：2020-11-04
Applicant: Magic Leap, Inc.
Inventor： Mauro Melli , Mohammadreza Khorasaninejad , Christophe Peroz , Pierre St. Hilaire , Dianmin Lin
Abstract: Display devices include waveguides with metasurfaces as in-coupling and/or out-coupling optical elements. The metasurfaces may be formed on a surface of the waveguide and may include a plurality or an array of sub-wavelength-scale (e.g., nanometer-scale) protrusions. Individual protrusions may include horizontal and/or vertical layers of different materials which may have different refractive indices, allowing for enhanced manipulation of light redirecting properties of the metasurface. Some configurations and combinations of materials may advantageously allow for broadband metasurfaces. Manufacturing methods described herein provide for vertical and/or horizontal layers of different materials in a desired configuration or profile.
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公开(公告)号：US20230016683A1
公开(公告)日：2023-01-19
申请号：US17951451
申请日：2022-09-23
Applicant: Magic Leap, Inc.
Inventor： Mauro Melli
Abstract: In some embodiments, a display device includes one or more waveguides having a vapor deposited light absorbing film on edges of the waveguide to mitigate ghost images. In some embodiments, the film is formed directly on the edge of the waveguide by a vapor deposition, such as an evaporative deposition process. In some embodiments, the light absorbing films may comprise carbon, for example carbon in the form of one or more allotropes of carbon, such as fullerenes, or black silicon.
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公开(公告)号：US20230016301A1
公开(公告)日：2023-01-19
申请号：US17868617
申请日：2022-07-19
Applicant: Magic Leap, Inc.
Inventor： Mauro Melli , Christophe Peroz , Vikramjit Singh
Abstract: Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.
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公开(公告)号：US20220262082A1
公开(公告)日：2022-08-18
申请号：US17733391
申请日：2022-04-29
Applicant: Magic Leap, Inc.
Inventor： Melanie Maputol West , Christophe Peroz , Mauro Melli
Abstract: The present disclosure relates to display systems and, more particularly, to augmented reality display systems. In one aspect, a method of fabricating an optical element includes providing a substrate having a first refractive index and transparent in the visible spectrum. The method additionally includes forming on the substrate periodically repeating polymer structures. The method further includes exposing the substrate to a metal precursor followed by an oxidizing precursor. Exposing the substrate is performed under a pressure and at a temperature such that an inorganic material comprising the metal of the metal precursor is incorporated into the periodically repeating polymer structures, thereby forming a pattern of periodically repeating optical structures configured to diffract visible light. The optical structures have a second refractive index greater than the first refractive index.
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公开(公告)号：US11360306B2
公开(公告)日：2022-06-14
申请号：US16733168
申请日：2020-01-02
Applicant: Magic Leap, Inc.
Inventor： Dianmin Lin , Mauro Melli , Pierre St. Hilaire , Christophe Peroz , Evgeni Poliakov
IPC: G02B27/01 , G02B5/30 , H04N13/344 , H04N13/349 , G02B30/35 , G02B5/18
Abstract: An optical system comprises an optically transmissive substrate comprising a metasurface which comprises a grating comprising a plurality of unit cells. Each unit cell comprises a laterally-elongated first nanobeam having a first width; and a laterally-elongated second nanobeam spaced apart from the first nanobeam by a gap, the second nanobeam having a second width larger than the first width. A pitch of the unit cells is 10 nm to 1 μm. The heights of the first and the second nanobeams are: 10 nm to 450 nm where a refractive index of the substrate is more than 3.3; and 10 nm to 1 μm where the refractive index is 3.3 or less.
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Patent Agency Ranking
56.发明申请公开(公告)号：US20220155502A1
公开(公告)日：2022-05-19
申请号：US17437729
申请日：2020-03-11
Applicant: Magic Leap, Inc.
Inventor： Mauro Melli , Christophe Peroz , Melanie Maputol West
Abstract: The present disclosure generally relates to display systems, and more particularly to augmented reality display systems and methods of fabricating the same. A method of fabricating a display device includes providing a substrate comprising a lithium (Li)-based oxide and forming an etch mask pattern exposing regions of the substrate. The method additionally includes plasma etching the exposed regions of the substrate using a gas mixture comprising CHF3 to form a diffractive optical element, wherein the diffractive optical element comprises Li-based oxide features configured to diffract visible light incident thereon.
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公开(公告)号：US11254606B2
公开(公告)日：2022-02-22
申请号：US16598868
申请日：2019-10-10
Applicant: Magic Leap, Inc.
Inventor： Mauro Melli , Christophe Peroz , Vikramjit Singh
Abstract: Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.
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公开(公告)号：US20210268756A1
公开(公告)日：2021-09-02
申请号：US17186902
申请日：2021-02-26
Applicant: Magic Leap, Inc.
Inventor： Mauro Melli , Chieh Chang , Ling Li , Melanie Maputol West , Christophe Peroz , Ali Karbasi , Sharad D. Bhagat , Brian George Hill
Abstract: Methods are disclosed for fabricating molds for forming eyepieces having waveguides with integrated spacers. The molds are formed by etching deep holes (e.g., 5 μm to 1000 μm deep) into a substrate using a wet etch or dry etch. The etch masks for defining the holes may be formed with a thick metal layer and/or multiple layers of different metals. A resist layer may be disposed over the etch mask. The resist layer may be patterned to form a pattern of holes, the pattern may be transferred to the etch mask, and the etch mask may be used to transfer the pattern into the underlying substrate. The patterned substrate may be utilized as a mold onto which a flowable polymer may be introduced and allowed to harden. Hardened polymer in the holes may form integrated spacers. The hardened polymer may be removed from the mold to form a waveguide with integrated spacers.
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59.发明授权公开(公告)号：US11067860B2
公开(公告)日：2021-07-20
申请号：US15795067
申请日：2017-10-26
Applicant: MAGIC LEAP, INC.
Inventor： Chulwoo Oh , Mauro Melli , Christophe Peroz , Vikramjit Singh , Frank Xu , Michael Anthony Klug
IPC: G02F1/1347
Abstract: An optical device includes a liquid crystal layer having a first plurality of liquid crystal molecules arranged in a first pattern and a second plurality of liquid crystal molecules arranged in a second pattern. The first and the second pattern are separated from each other by a distance of about 20 nm and about 100 nm along a longitudinal or a transverse axis of the liquid crystal layer. The first and the second plurality of liquid crystal molecules are configured as first and second grating structures that can redirect light of visible or infrared wavelengths.
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公开(公告)号：US20200048143A1
公开(公告)日：2020-02-13
申请号：US16598868
申请日：2019-10-10
Applicant: Magic Leap, Inc.
Inventor： Mauro Melli , Christophe Peroz , Vikramjit Singh
Abstract: Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.
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