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    Metasurfaces for redirecting light and methods for fabricating
    1.
    发明授权
    Metasurfaces for redirecting light and methods for fabricating 有权

    公开(公告)号：US12248166B2

    公开(公告)日：2025-03-11

    申请号：US18464732

    申请日：2023-09-11

    Applicant: Magic Leap, Inc.

    Inventor： Dianmin Lin ,  Mauro Melli ,  Pierre St. Hilaire ,  Christophe Peroz ,  Evgeni Poliakov

    IPC: G02B6/00 ,  F21V8/00 ,  G02B6/122 ,  G02B6/293 ,  G02B27/01 ,  G02B5/18

    Abstract: A display system comprises a waveguide having light incoupling or light outcoupling optical elements formed of a metasurface. The metasurface is a multilevel (e.g., bi-level) structure having a first level defined by spaced apart protrusions formed of a first optically transmissive material and a second optically transmissive material between the protrusions. The metasurface also includes a second level formed by the second optically transmissive material. The protrusions on the first level may be patterned by nanoimprinting the first optically transmissive material, and the second optically transmissive material may be deposited over and between the patterned protrusions. The widths of the protrusions and the spacing between the protrusions may be selected to diffract light, and a pitch of the protrusions may be 10-600 nm.

    DIFFRACTION GRATINGS FORMED BY METASURFACES HAVING DIFFERENTLY ORIENTED NANOBEAMS
    5.
    发明申请
    DIFFRACTION GRATINGS FORMED BY METASURFACES HAVING DIFFERENTLY ORIENTED NANOBEAMS 有权

    公开(公告)号：US20220163709A1

    公开(公告)日：2022-05-26

    申请号：US17666224

    申请日：2022-02-07

    Applicant: Magic Leap, Inc.

    Inventor： Dianmin Lin ,  Michael Anthony Klug ,  Pierre St. Hilaire ,  Mauro Melli ,  Christophe Peroz ,  Evgeni Poliakov

    IPC: G02B5/18 ,  F21V8/00 ,  G02B27/01

    Abstract: Metasurfaces provide compact optical elements in head-mounted display systems to, e.g., incouple light into or outcouple light out of a waveguide. The metasurfaces may be formed by a plurality of repeating unit cells, each unit cell comprising two sets or more of nanobeams elongated in crossing directions: one or more first nanobeams elongated in a first direction and a plurality of second nanobeams elongated in a second direction. As seen in a top-down view, the first direction may be along a y-axis, and the second direction may be along an x-axis. The unit cells may have a periodicity in the range of 10 nm to 1 μm, including 10 nm to 500 nm or 300 nm to 500 nm. Advantageously, the metasurfaces provide diffraction of light with high diffraction angles and high diffraction efficiencies over a broad range of incident angles and for incident light with circular polarization.

    Diffraction gratings formed by metasurfaces having differently oriented nanobeams
    6.
    发明授权
    Diffraction gratings formed by metasurfaces having differently oriented nanobeams 有权

    公开(公告)号：US11243338B2

    公开(公告)日：2022-02-08

    申请号：US16672983

    申请日：2019-11-04

    Applicant: Magic Leap, Inc.

    Inventor： Dianmin Lin ,  Michael Anthony Klug ,  Pierre St. Hilaire ,  Mauro Melli ,  Christophe Peroz ,  Evgeni Poliakov

    IPC: G02B5/18 ,  F21V8/00 ,  G02B27/01

    Abstract: Metasurfaces provide compact optical elements in head-mounted display systems to, e.g., incouple light into or outcouple light out of a waveguide. The metasurfaces may be formed by a plurality of repeating unit cells, each unit cell comprising two sets or more of nanobeams elongated in crossing directions: one or more first nanobeams elongated in a first direction and a plurality of second nanobeams elongated in a second direction. As seen in a top-down view, the first direction may be along a y-axis, and the second direction may be along an x-axis. The unit cells may have a periodicity in the range of 10 nm to 1 μm, including 10 nm to 500 nm or 300 nm to 500 nm. Advantageously, the metasurfaces provide diffraction of light with high diffraction angles and high diffraction efficiencies over a broad range of incident angles and for incident light with circular polarization.

    OPTICAL ELEMENTS BASED ON POLYMERIC STRUCTURES INCORPORATING INORGANIC MATERIALS
    7.
    发明申请
    OPTICAL ELEMENTS BASED ON POLYMERIC STRUCTURES INCORPORATING INORGANIC MATERIALS 有权

    公开(公告)号：US20210295601A1

    公开(公告)日：2021-09-23

    申请号：US17169273

    申请日：2021-02-05

    Applicant: Magic Leap, Inc.

    Inventor： Melanie Maputol West ,  Christophe Peroz ,  Mauro Melli

    IPC: G06T19/00 ,  G02B27/01 ,  G06F3/16 ,  G02B27/42 ,  G06T7/50 ,  G02B5/18 ,  B29D11/00 ,  G02B6/24

    Abstract: The present disclosure relates to display systems and, more particularly, to augmented reality display systems. In one aspect, a method of fabricating an optical element includes providing a substrate having a first refractive index and transparent in the visible spectrum. The method additionally includes forming on the substrate periodically repeating polymer structures. The method further includes exposing the substrate to a metal precursor followed by an oxidizing precursor. Exposing the substrate is performed under a pressure and at a temperature such that an inorganic material comprising the metal of the metal precursor is incorporated into the periodically repeating polymer structures, thereby forming a pattern of periodically repeating optical structures configured to diffract visible light. The optical structures have a second refractive index greater than the first refractive index.

    Waveguides with light absorbing films and processes for forming the same
    8.
    发明授权
    Waveguides with light absorbing films and processes for forming the same 有权

    公开(公告)号：US10852542B2

    公开(公告)日：2020-12-01

    申请号：US15912877

    申请日：2018-03-06

    Applicant: Magic Leap, Inc.

    Inventor： Mauro Melli

    IPC: G02B27/01 ,  F21V8/00

    Abstract: In some embodiments, a display device includes one or more waveguides having a vapor deposited light absorbing film on edges of the waveguide to mitigate ghost images. In some embodiments, the film is formed directly on the edge of the waveguide by a vapor deposition, such as an evaporative deposition process. In some embodiments, the light absorbing films may comprise carbon, for example carbon in the form of one or more allotropes of carbon, such as fullerenes, or black silicon.

    Patterning of high refractive index glasses by plasma etching
    9.
    发明授权
    Patterning of high refractive index glasses by plasma etching 有权

    公开(公告)号：US10442727B2

    公开(公告)日：2019-10-15

    申请号：US15862078

    申请日：2018-01-04

    Applicant: Magic Leap, Inc.

    Inventor： Mauro Melli ,  Christophe Peroz ,  Vikramjit Singh

    IPC: C03C15/00 ,  F21V8/00 ,  G06F1/16 ,  C03C3/097 ,  H04N5/225 ,  G02B27/22

    Abstract: Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.

    Fabricating non-uniform diffraction gratings
    10.
    发明授权
    Fabricating non-uniform diffraction gratings 有权

    公开(公告)号：US10436958B2

    公开(公告)日：2019-10-08

    申请号：US15723851

    申请日：2017-10-03

    Applicant: Magic Leap, Inc.

    Inventor： Mauro Melli ,  Christophe Peroz

    IPC: G02B5/18 ,  H01J37/305 ,  G02B27/42 ,  H01J37/317 ,  G02B6/124 ,  G02B6/136 ,  G02B27/01 ,  G02B6/12

    Abstract: A method of fabricating non-uniform gratings includes implanting different densities of ions into corresponding areas of a substrate, patterning, e.g., by lithography, a resist layer on the substrate, etching the substrate with the patterned resist layer, and then removing the resist layer from the substrate, leaving the substrate with at least one grating having non-uniform characteristics associated with the different densities of ions implanted in the areas. The method can further include using the substrate having the grating as a mold to fabricate a corresponding grating having corresponding non-uniform characteristics, e.g., by nanoimprint lithography.

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