公开(公告)号：US06755579B2

公开(公告)日：2004-06-29

申请号：US10309247

申请日：2002-12-04

申请人： Shinji Tarutani

发明人： Shinji Tarutani

IPC分类号： G03D504

CPC分类号： G03F7/3021

摘要： A developer and a method of a developing process which improve upon uniformity in a size of a resist pattern are provided. The developer includes a wafer rotating system (10) and a wafer oscillating system (20) which oscillates whole of the wafer rotating system (10) in one-dimensional direction, and the wafer oscillating system (20) has a motor supporting part (4) which mounts and fixes a motor part (1), a rail (5) which engages a rail groove (41) formed on a bottom side of the motor supporting part (4) and also enables the motor supporting part (4) to slide smoothly in one-dimensional direction, a guide bar (6) which is coupled with the motor part (1) and transmits a propulsion which enables the motor part (1) to slide along the rail (5) and a linear motor part (7) which engages the guide bar (6) and is a propulsion supplying source which supplies the propulsion with the wafer rotating system (10) by sliding the guide bar (6) in the axial direction of the guide bar (6).

摘要翻译： 提供了改善抗蚀剂图案尺寸均匀性的显影工艺的显影剂和显影方法。该显影剂包括晶片旋转系统（10）和振荡整个晶片旋转系统的晶片振荡系统（20） 10），并且所述晶片振荡系统（20）具有电动机支撑部（4），所述电动机支撑部（4）安装并固定电动机部（1），轨道（5）与形成在 电动机支撑部分（4）的底侧，并且还使得电动机支撑部件（4）能够在一维方向上平滑地滑动;导杆（6），其与电动机部件（1）联接并传递推进 这使得电动机部件（1）能够沿着导轨（5）滑动，并且线性电动机部件（7）与导杆（6）接合，并且是推进供给源，其将推进与晶片旋转系统（10） 通过在引导杆（6）的轴向方向滑动引导杆（6）。