公开(公告)号：US20140347642A1

公开(公告)日：2014-11-27

申请号：US14456845

申请日：2014-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof LOOPSTRA ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种用于位于投影系统和基板之间的浸液的光刻投影装置。公开了几种方法和机构来保护投影系统，基板台和液体限制系统的部件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。

公开(公告)号：US20140253890A1

公开(公告)日：2014-09-11

申请号：US14273310

申请日：2014-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Aleksey Yurievich KOLESNYCHENKO ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract translation: 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。