公开(公告)号：US06467976B2

公开(公告)日：2002-10-22

申请号：US09849260

申请日：2001-05-07

申请人： Yuji Matsuyama ,  Junichi Kitano ,  Takahiro Kitano

发明人： Yuji Matsuyama ,  Junichi Kitano ,  Takahiro Kitano

IPC分类号： G03D500

CPC分类号： H01L21/67178 ,  H01L21/67017 ,  H01L21/67225

摘要： The present invention has a processing zone having a coating unit for forming a coating film on a substrate, a developing unit for performing development of the substrate, a heat treatment unit for performing heat treatment of the substrate, and a first transfer device for transferring the substrate from/to the coating unit, the developing unit and the heat treatment unit, an interface section in which the substrate is transferred at least on a path between the processing zone and an exposure processing unit outside the system for performing exposure processing for the substrate, a casing for housing the processing zone and the interface section, a gas supply device for supplying an inert gas into the interface section, and an exhaust portion through which an atmosphere in the interface section is discharged, and the heat treatment unit, and a second transfer device for transferring the substrate on a path between the heat treatment unit and the exposure processing unit are disposed in the interface section. According to the present invention, impurities at a molecular level, such as oxygen, basic substances, ozone, and organic substances, can be prevented from adhering to a substrate, and thus treatment and processing for the substrate are suitably performed.

摘要翻译： 本发明的处理区域具有在基板上形成涂膜的涂布单元，进行基板显影的显影单元，对该基板进行热处理的热处理单元和将该基板进行热处理的第一输送装置 基板从涂覆单元，显影单元和热处理单元的基板，至少在处理区域和系统外部的曝光处理单元之间的路径上转移基板的接口部分，用于对基板进行曝光处理 ，用于容纳加工区域和界面部分的壳体，用于向界面部分供应惰性气体的气体供应装置，以及排出界面部分中的气体的排气部分和热处理单元，以及 第二转印装置，用于在热处理单元和曝光处理单元之间的路径上传送基板 界面部分。根据本发明，可以防止分子水平的诸如氧，碱性物质，臭氧和有机物质的杂质粘附到基底上，从而适当地进行基底的处理和加工。

公开(公告)号：US06333003B1

公开(公告)日：2001-12-25

申请号：US09083096

申请日：1998-05-22

申请人： Takayuki Katano ,  Junichi Kitano ,  Masami Akimoto ,  Norio Semba

发明人： Takayuki Katano ,  Junichi Kitano ,  Masami Akimoto ,  Norio Semba

IPC分类号： A61L914

CPC分类号： H01L21/67178 ,  F24F3/161 ,  G03F7/70858 ,  H01L21/67017

摘要： A treatment apparatus for treating a substrate in an isolated treatment space in an air-conditioned clean room, comprising a removing unit including a plurality of removing sections for recovering at least some of air in the treatment space and removing impurities from the recovered air, the removing sections being arranged in series and each including a supply mechanism for supplying an impurity remover capable of removing the impurities by touching the recovered air, a temperature adjustment unit for adjusting the temperature of the air cleared of the impurities by the removing unit, and a return circuit for returning the air, adjusted in temperature by the temperature adjustment unit, to the treatment space.

摘要翻译： 一种用于处理空调净化室中的分离处理空间中的基板的处理装置，包括：除去单元，其包括多个除去部分，用于回收处理空间中的至少一些空气并从回收的空气中除去杂质; 除去部分串联布置，并且每个部分包括用于提供能够通过接触回收的空气来去除杂质的杂质去除器的供给机构;温度调节单元，用于调节由除去单元排出的杂质的温度;以及 返回电路，用于将由温度调节单元调节的空气返回到处理空间。

公开(公告)号：US5434644A

公开(公告)日：1995-07-18

申请号：US245668

申请日：1994-05-18

申请人： Junichi Kitano ,  Misako Saitou ,  Yuji Kakazu

发明人： Junichi Kitano ,  Misako Saitou ,  Yuji Kakazu

IPC分类号： B01D53/42 ,  G03F7/26 ,  G03B27/52 ,  G03B27/42

CPC分类号： B01D53/42 ,  G03F7/26

摘要： A filter device for a resist-treatment system, comprising a frame having an aperture through which the outside air is introduced into the resist-treatment system, a fan unit for sucking the outside air into the aperture, and a filter element supported by means of the frame so as to be situated at least on one side the fan unit, the filter element including a porous body containing an acid component capable of adsorbing an alkali component by reaction.

摘要翻译： 一种用于抗蚀剂处理系统的过滤装置，包括具有孔的框架，外部空气通过该孔引入抗蚀剂处理系统，用于将外部空气吸入孔中的风扇单元，以及通过 所述框架至少位于所述风扇单元的一侧，所述过滤元件包括含有能够通过反应吸附碱成分的酸成分的多孔体。