System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers
    62.
    发明授权
    System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers 失效
    用于同时测量薄膜磁盘和硅片中的薄膜层厚度,反射率,粗糙度,表面轮廓和磁性图案的系统和方法

    公开(公告)号:US06665078B1

    公开(公告)日:2003-12-16

    申请号:US09414388

    申请日:1999-10-07

    CPC classification number: G01B11/303 G01B11/065 G01N21/211

    Abstract: A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks and silicon wafers at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat is provided. The system and method involve a focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. This generates both reflected and scattered light that may be measured to determine various values and properties related to the surface of the disk, including identifying the Kerr-effect in reflected light for determination of point magnetic properties. In addition, the present invention can mark the position of an identified defect.

    Abstract translation: 用于以基本上不是薄膜的布鲁斯特角的角度执行磁性成像,光学轮廓和测量润滑剂厚度和降解,碳磨损,碳厚度和薄膜磁盘和硅晶片的表面粗糙度的系统和方法( 碳)保护罩。 该系统和方法涉及一种聚焦的光,其偏振可以在P或S之间切换,偏振以一定角度入射到薄膜磁盘的表面。 这产生可以测量的反射和散射光,以确定与盘的表面相关的各种值和性质,包括识别用于确定点磁性的反射光中的克尔效应。 此外,本发明可以标识所识别的缺陷的位置。

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