公开(公告)号：US4725737A

公开(公告)日：1988-02-16

申请号：US797131

申请日：1985-11-12

申请人： Toshihiko Nakata ,  Masataka Shiba ,  Yoshitada Oshida ,  Sachio Uto ,  Atsuhiro Yoshizaki

发明人： Toshihiko Nakata ,  Masataka Shiba ,  Yoshitada Oshida ,  Sachio Uto ,  Atsuhiro Yoshizaki

IPC分类号： G03F9/00 ,  G01V9/04 ,  G01B11/00

CPC分类号： G03F9/7076

摘要： An alignment method and apparatus for reduction projection type aligner in which the rough detection of reticle position in the reticle alignment process at the time of mounting a reticle and the fine detection of reticle position in the wafer alignment for the alignment between a wafer and the reticle are performed automatically by the same reticle alignment pattern and the same optical alignment detection system. A plurality of one- or two-dimensional Fresnel zone plates having different shapes of diffraction patterns formed outside of a reticle circuit pattern and arranged at a position outward of the entrance pupil of the reduction projection lens are used as a reticle alignment pattern to detect the absolute position of the reticle. The detection field of view of the optical alignment detection system is thus effectively widened to make pattern detection possible with high magnification for an improved detection accuracy. The same reticle alignment pattern and the same optical alignment detection system are used for rough detection of reticle position in reticle alignment and fine detection of reticle position in wafer alignment. In the optical alignment detection system, on the other hand, the image position of the diffraction pattern from the reticle alignment pattern and the image position of the wafer alignment pattern are located at the same distance from the reticle surface.

摘要翻译： 用于还原投影型对准器的对准方法和装置，其中在安装光罩时在光罩对准过程中对光罩位置进行粗略检测，并且在晶片对准中精确检测标线片位置以用于晶片和掩模版之间的对准 通过相同的掩模版对准图案和相同的光学对准检测系统自动执行。 使用在分划板电路图案之外形成并且布置在还原投影透镜的入射光瞳外侧的位置处具有不同形状的衍射图案的多个一维或二维菲涅尔区域板作为掩模版对准图案，以检测 掩模版的绝对位置。 因此光学对准检测系统的检测视场被有效地加宽，以便以高放大率进行图案检测以提高检测精度。 相同的掩模版对准图案和相同的光学对准检测系统用于粗略检测掩模版对准中的掩模版位置和精确检测晶片对准中的掩模版位置。 另一方面，在光学对准检测系统中，衍射图案的标线片取向图案的图像位置和晶片对准图案的图像位置位于与标线片表面相同的距离处。

公开(公告)号：US4564296A

公开(公告)日：1986-01-14

申请号：US305374

申请日：1981-09-24

申请人： Yoshitada Oshida ,  Hiroshi Makihara ,  Nobuhiko Aoki

发明人： Yoshitada Oshida ,  Hiroshi Makihara ,  Nobuhiko Aoki

IPC分类号： G01B11/00 ,  G01B11/06 ,  H01L21/66

CPC分类号： G01B11/06

摘要： A plate thickness measuring method and apparatus, is provided wherein a fine pattern is projected on the front and rear surfaces of an object to be measured via object lenses oppositely provided on the front and rear surfaces of the object to be measured in its thickness. The image of the projected pattern on the object to be measured is formed via said object lenses, and the contrast of the formed pattern image is detected. Then the object lenses are moved slightly to achieve the maximum of the contrast, or to perform an automatic focusing control. The thickness of the object to be measured can then be estimated from the difference of the positions of the object lenses at which the maximum contrast, or the focused condition, are obtained.

摘要翻译： 提供了一种板厚测量方法和装置，其中精细图案通过相对设置在被测量物体的前表面和后表面上的物镜在其厚度上投影在被测量物体的前表面和后表面上。 通过所述物镜形成待测物体上的投影图案的图像，并且检测形成的图案图像的对比度。 然后物镜稍微移动以达到对比度的最大值，或进行自动对焦控制。 然后可以从获得最大对比度或聚焦条件的物镜的位置的差异来估计被测量物体的厚度。

公开(公告)号：US4343553A

公开(公告)日：1982-08-10

申请号：US181768

申请日：1980-08-27

申请人： Yasuo Nakagawa ,  Hiroshi Makihira ,  Yoshitada Oshida ,  Nobuyuki Akiyama

发明人： Yasuo Nakagawa ,  Hiroshi Makihira ,  Yoshitada Oshida ,  Nobuyuki Akiyama

IPC分类号： G01B11/25 ,  G01B11/00

CPC分类号： G01B11/2545

摘要： A shape detecting apparatus comprises a slit projecting means for projecting a slit image on a three-dimensional object such as a soldered area, a positioning means for positioning the three-dimensional object relative to the slit projecting means, an image pickup means for two-dimensionally scanning the slit image projected by the slit projecting means to pickup the image, a light segment extracting circuit including a center position extracting means for extracting a mean position (Z.sub.1 +Z.sub.2)/2 of two position signals Z.sub.1 and Z.sub.2 at which a video signal derived by transversely scanning the slit image by the image pickup means corresponds, to a first higher reference V.sub.1 when the video signal exceeds the first higher reference V.sub.1, a maximum value position extracting circuit for extracting a position Z corresponding to a maximum value of the video signal when the maximum value of the video signal is no higher than the first higher reference V.sub.1 and exceeds a second lower reference V.sub.2 and an erasing means for erasing the position signal when the maximum value of the video signal is no higher than the second lower reference V.sub.2, and a detecting means for detecting undersoldered condition and oversoldered condition by analyzing and evaluating the three-dimensional object based on the light segment position information derived from the light segment extracting circuit.

摘要翻译： 一种形状检测装置，包括：狭缝突出装置，用于将缝合图像投射在诸如焊接区域的三维物体上;定位装置，用于相对于狭缝突出装置定位三维物体;图像拾取装置， 对由狭缝投影装置投影的狭缝图像进行二维扫描以拾取图像;光段提取电路，包括中心位置提取装置，用于提取两个位置信号Z1和Z2的平均位置（Z1 + Z2）/ 2， 通过图像拾取装置横向扫描狭缝图像导出的信号对应于当视频信号超过第一较高参考值V1时的第一较高参考V1，最大值位置提取电路，用于提取对应于最大值的位置Z 当视频信号的最大值不高于第一较高参考V1并且超过第二较低参考值V2和呃时，视频信号 当视频信号的最大值不高于第二较低参考值V2时，用于擦除位置信号的灰度装置;以及检测装置，用于通过基于光段对三维物体进行分析和评估来检测底部状态和过弯状态 从光段提取电路得到的位置信息。

公开(公告)号：US4125859A

公开(公告)日：1978-11-14

申请号：US737329

申请日：1976-11-01

申请人： Yoshitada Oshida ,  Susumu Sawano

发明人： Yoshitada Oshida ,  Susumu Sawano

IPC分类号： G11B7/12

CPC分类号： G11B7/12

摘要： Information play-back apparatus comprising a laser source, an information recorded medium, optical means for guiding a laser beam from the laser source to an information recorded track on the information recorded medium, and means for varying the size of the spot of the laser beam on the information recorded track in dependence on the position of the track on the information recorded medium.

摘要翻译： 信息回放装置，包括激光源，信息记录介质，用于将来自激光源的激光束引导到信息记录介质上的信息记录轨道的光学装置，以及用于改变激光束点的尺寸的装置 根据信息记录介质上轨道的位置对记录的信息进行记录。