公开(公告)号：US07012733B2

公开(公告)日：2006-03-14

申请号：US11001807

申请日：2004-12-01

申请人： Andrew G. Huibers

发明人： Andrew G. Huibers

IPC分类号： G02B26/00 ,  G02B26/02

CPC分类号： G02B26/0833 ,  G02B26/08 ,  G02B26/0841 ,  Y10S359/904

摘要： A spatial light modulator including first and second substrate, and an array of deflectable elements disposed within a gap between the first and second substrates is disclosed herein. For electrostatically actuating the deflectable elements, an array of electrodes and circuitry is provided and positioned proximate to the deflectable elements.

公开(公告)号：US07006275B2

公开(公告)日：2006-02-28

申请号：US10857055

申请日：2004-05-28

申请人： Andrew G. Huibers

发明人： Andrew G. Huibers

IPC分类号： G02B26/00 ,  G02B26/08

CPC分类号： G03B21/28 ,  G02B26/0841 ,  Y10S359/904

摘要： In order to minimize light diffraction along the direction of switching and more particularly light diffraction into the acceptance cone of the collection optics, in the present invention, micromirrors are provided which are not rectangular. Also, in order to minimize the cost of the illumination optics and the size of the display unit of the present invention, the light source is placed orthogonal to the rows (or columns) of the array, and/or the light source is placed orthogonal to a side of the frame defining the active area of the array. The incident light beam, though orthogonal to the sides of the active area, is not however, orthogonal to any substantial portion of sides of the individual micromirrors in the array. Orthogonal sides cause incident light to diffract along the direction of micromirror switching, and result in light ‘leakage’ into the ‘on’ state even if the micromirror is in the ‘off’ state. This light diffraction decreases the contrast ratio of the micromirror. The micromirrors of the present invention result in an improved contrast ratio, and the arrangement of the light source to micromirror array in the present invention results in a more compact system. Another feature of the invention is the ability of the micromirrors to pivot in opposite direction to on and off positions (the on position directing light to collection optics), where the movement to the on position is greater than movement to the off position. A further feature of the invention is a package for the micromirror array, the package having a window that is not parallel to the substrate upon which the micromirrors are formed. One example of the invention includes all the above features.

摘要翻译： 为了最小化沿着切换方向的光衍射，并且更特别地，将光衍射最小化到收集光学器件的接收锥体中，在本发明中，提供了不是矩形的微镜。 此外，为了最小化本发明的照明光学器件的成本和显示单元的尺寸，将光源与阵列的行（或列）正交放置，和/或将光源正交 到帧的定义阵列的有效区域的一侧。 然而，入射光束虽然正交于有源区域的侧面，但是不是与阵列中的各个微镜的任何相当大部分的侧面正交。 正交侧使得入射光沿着微镜切换的方向衍射，并且即使微镜处于“关闭”状态，也导致光“泄漏”进入“打开”状态。 该光衍射降低了微镜的对比度。 本发明的微反射镜导致对比度提高，并且在本发明中光源到微镜阵列的布置导致更紧凑的系统。 本发明的另一个特征是微镜能够相对于打开和关闭位置（将光引导到收集光学器件）的相对方向枢转，其中到打开位置的移动大于移动到关闭位置。 本发明的另一个特征是用于微镜阵列的封装，该封装具有不与形成微反射镜的基板平行的窗口。 本发明的一个实例包括所有上述特征。

公开(公告)号：US06972891B2

公开(公告)日：2005-12-06

申请号：US11034399

申请日：2005-01-11

申请人： Satyadev R. Patel ,  Andrew G. Huibers

发明人： Satyadev R. Patel ,  Andrew G. Huibers

IPC分类号： B81C20060101 ,  G02B26/00 ,  G02B26/08 ,  G02F1/29 ,  H04N5/74

CPC分类号： B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

摘要： A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

公开(公告)号：US06947200B2

公开(公告)日：2005-09-20

申请号：US10948871

申请日：2004-09-24

申请人： Andrew G. Huibers

发明人： Andrew G. Huibers

IPC分类号： G02B26/08 ,  G02B26/00

CPC分类号： G02B26/0833 ,  G02B26/08 ,  G02B26/0841 ,  Y10S359/904

摘要： A spatial light modulator includes an upper optically transmissive substrate held above a lower substrate containing addressing circuitry. One or more electrostatically deflectable elements are suspended by hinges from the upper substrate. In operation, individual mirrors are selectively deflected and serve to spatially modulate light that is incident to, and then reflected back through, the upper substrate. Motion stops may be attached to the reflective deflectable elements so that the mirror does not snap to the bottom substrate. Instead, the motion stop rests against the upper substrate thus limiting the deflection angle of the reflective deflectable elements.

公开(公告)号：US06867897B2

公开(公告)日：2005-03-15

申请号：US10366297

申请日：2003-02-12

申请人： Satyadev R. Patel ,  Andrew G. Huibers

发明人： Satyadev R. Patel ,  Andrew G. Huibers

IPC分类号： G02B26/08 ,  G03B21/28 ,  G02B26/00 ,  C23F1/00 ,  G02B7/182 ,  H01L21/00

CPC分类号： G03B21/28 ,  G02B26/0841

摘要： A spatial light modulator is disclosed, along with methods for making such a modulator, that comprises an array of micromirrors each having a hinge and a micromirror plate held via the hinge on a substrate, the micromirror plate being disposed in a plane separate from the hinge and having a diagonal extending across the micromirror plate, the micromirror plate being attached to the hinge such that the micromirror plate can rotate along a rotation axis that is parallel to, but off-set from the diagonal of the micromirror plate. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

摘要翻译： 公开了一种空间光调制器，以及用于制造这种调制器的方法，其包括每个具有铰链的微镜阵列和通过铰链固定在基板上的微镜板，微镜板设置在与铰链相分离的平面中 并且具有延伸穿过微镜板的对角线，微镜板附接到铰链，使得微镜板可以沿着与微镜板的对角线平行但偏离的旋转轴线旋转。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：US06800210B2

公开(公告)日：2004-10-05

申请号：US10154150

申请日：2002-05-22

申请人： Satyadev R. Patel ,  Andrew G. Huibers ,  Gregory P. Schaadt ,  Peter J. Heureux

发明人： Satyadev R. Patel ,  Andrew G. Huibers ,  Gregory P. Schaadt ,  Peter J. Heureux

IPC分类号： H01L21306

CPC分类号： B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

摘要： An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

摘要翻译： 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

公开(公告)号：US06538800B2

公开(公告)日：2003-03-25

申请号：US10043703

申请日：2002-01-09

申请人： Andrew G. Huibers

发明人： Andrew G. Huibers

IPC分类号： G02B2600

CPC分类号： G02B26/0833 ,  G02B26/08 ,  G02B26/0841 ,  Y10S359/904

摘要： A spatial light modulator includes an upper optically transmissive substrate held above a lower substrate containing addressing circuitry. One or more electrostatically deflectable elements are suspended by hinges from the upper substrate. In operation, individual mirrors are selectively deflected and serve to spatially modulate light that is incident to, and then reflected back through, the upper substrate. Motion stops may be attached to the reflective deflectable elements so that the mirror does not snap to the bottom substrate. Instead, the motion stop rests against the upper substrate thus limiting the deflection angle of the reflective deflectable elements.