Lithography system and method for storing positional data of a target
    1.
    发明授权
    Lithography system and method for storing positional data of a target 有权
    光刻系统和存储目标位置数据的方法

    公开(公告)号:US09009631B2

    公开(公告)日:2015-04-14

    申请号:US13545896

    申请日:2012-07-10

    IPC分类号: G06F17/50 G03F7/20

    CPC分类号: G03F7/70725 G03F7/70775

    摘要: The invention relates to a lithography system for patterning a target, said system comprising a feedback control system comprising an actuator for displacing the target, a measurement system for measuring a position of said target, and a control unit adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system for storing the measured positions, comprising a receive buffer and a storage unit with a second latency being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection for transmitting said measured positions to the storage system.

    摘要翻译: 本发明涉及一种用于图案化目标的光刻系统,所述系统包括反馈控制系统,该反馈控制系统包括用于移动目标的致动器,用于测量所述目标的位置的测量系统,以及适于基于 由所述测量系统测量的位置,所述反馈控制系统具有基于所述测量来测量和控制所述致动器之间的最大等待时间的第一等待时间,用于存储测量位置的存储系统,包括接收缓冲器和具有第二 延迟是在接收缓冲器中接收测量位置和存储存储单元中的所述测量位置之间的平均等待时间,其中第一等待时间比第二等待时间小至少一个数量级,反馈控制系统包括用于传输的单向连接 称存储系统的测量位置。

    LITHOGRAPHY SYSTEM AND METHOD FOR STORING POSITIONAL DATA OF A TARGET
    2.
    发明申请
    LITHOGRAPHY SYSTEM AND METHOD FOR STORING POSITIONAL DATA OF A TARGET 有权
    用于存储目标的位置数据的算法系统和方法

    公开(公告)号:US20130016327A1

    公开(公告)日:2013-01-17

    申请号:US13545896

    申请日:2012-07-10

    IPC分类号: G03B27/53

    CPC分类号: G03F7/70725 G03F7/70775

    摘要: The invention relates to a lithography system for patterning a target, said system comprising a feedback control system comprising an actuator for displacing the target, a measurement system for measuring a position of said target, and a control unit adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system for storing the measured positions, comprising a receive buffer and a storage unit with a second latency being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection for transmitting said measured positions to the storage system.

    摘要翻译: 本发明涉及一种用于图案化目标的光刻系统,所述系统包括反馈控制系统,该反馈控制系统包括用于移动目标的致动器,用于测量所述目标的位置的测量系统,以及适于基于 由所述测量系统测量的位置,所述反馈控制系统具有基于所述测量来测量和控制所述致动器之间的最大等待时间的第一等待时间,用于存储测量位置的存储系统,包括接收缓冲器和具有第二 延迟是在接收缓冲器中接收测量位置和存储存储单元中的所述测量位置之间的平均等待时间,其中第一等待时间比第二等待时间小至少一个数量级,反馈控制系统包括用于传输的单向连接 称存储系统的测量位置。